JPS57129442A - Lithographic printing plate requiring no damping water - Google Patents

Lithographic printing plate requiring no damping water

Info

Publication number
JPS57129442A
JPS57129442A JP1502981A JP1502981A JPS57129442A JP S57129442 A JPS57129442 A JP S57129442A JP 1502981 A JP1502981 A JP 1502981A JP 1502981 A JP1502981 A JP 1502981A JP S57129442 A JPS57129442 A JP S57129442A
Authority
JP
Japan
Prior art keywords
substrate
photosensitive layer
chlorinated
printing plate
lithographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1502981A
Other languages
Japanese (ja)
Inventor
Shuji Fujioka
Genzaburo Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP1502981A priority Critical patent/JPS57129442A/en
Publication of JPS57129442A publication Critical patent/JPS57129442A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/003Printing plates or foils; Materials therefor with ink abhesive means or abhesive forming means, such as abhesive siloxane or fluoro compounds, e.g. for dry lithographic printing

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To eliminate the trouble in stripping of a photosensitive layer from a substrate and to inhibit the chemical reaction between the substrate material and the photosensitive layer by providing an intermediate layer contg. chlorinated polyolefin and a multifunctional vinyl monomer between the substrate and the photosensitive layer. CONSTITUTION:In a lithographic printing plate requiring no damping water wherein a photosensitive layer and silicone rubber are laminated on a substrate, 100pts.wt. chlorinated polyolefin such as chlorinated polyethylene, chlorinated polypropylene and the like made by chlorinating polyolefin and olefin copolymers is provided between the substrate and the photosensitive layer. The intermediate layer wherein the coating layer consisting essentially of 5-100pts.wt. a polyfunctional vinyl monomer which reacts to cross-link and to harden when irradiated with electron beams or UV rays (a compound of <=1,500mol.wt. having >=2 double bonds having radical polymerizability in the same molecule) for the purpose of cross-linking and binding the chlorinated polyolefin is interposed.
JP1502981A 1981-02-05 1981-02-05 Lithographic printing plate requiring no damping water Pending JPS57129442A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1502981A JPS57129442A (en) 1981-02-05 1981-02-05 Lithographic printing plate requiring no damping water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1502981A JPS57129442A (en) 1981-02-05 1981-02-05 Lithographic printing plate requiring no damping water

Publications (1)

Publication Number Publication Date
JPS57129442A true JPS57129442A (en) 1982-08-11

Family

ID=11877403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1502981A Pending JPS57129442A (en) 1981-02-05 1981-02-05 Lithographic printing plate requiring no damping water

Country Status (1)

Country Link
JP (1) JPS57129442A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001005885A1 (en) * 1999-07-15 2001-01-25 Dupont Dow Elastomers L.L.C. Uv curable elastomer composition
US6562415B2 (en) * 1998-01-21 2003-05-13 Dupont Dow Elastomers L.L.C. UV curable elastomer composition
WO2019235384A1 (en) * 2018-06-06 2019-12-12 三菱瓦斯化学株式会社 Actinic-ray-curable resin composition, gas-barrier film, and multilayer structure

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6562415B2 (en) * 1998-01-21 2003-05-13 Dupont Dow Elastomers L.L.C. UV curable elastomer composition
WO2001005885A1 (en) * 1999-07-15 2001-01-25 Dupont Dow Elastomers L.L.C. Uv curable elastomer composition
EP1338623A1 (en) * 1999-07-15 2003-08-27 Dupont Dow Elastomers L.L.C. UV curable elastomer composition
WO2019235384A1 (en) * 2018-06-06 2019-12-12 三菱瓦斯化学株式会社 Actinic-ray-curable resin composition, gas-barrier film, and multilayer structure
CN112218896A (en) * 2018-06-06 2021-01-12 三菱瓦斯化学株式会社 Active energy ray-curable resin composition, gas barrier film, and laminate
US11472906B2 (en) 2018-06-06 2022-10-18 Mitsubishi Gas Chemical Company, Inc. Actinic-ray-curable resin composition, gas-barrier film, and multilayer structure

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