JPS57153020A - Water-dispersible resin composition - Google Patents
Water-dispersible resin compositionInfo
- Publication number
- JPS57153020A JPS57153020A JP3922081A JP3922081A JPS57153020A JP S57153020 A JPS57153020 A JP S57153020A JP 3922081 A JP3922081 A JP 3922081A JP 3922081 A JP3922081 A JP 3922081A JP S57153020 A JPS57153020 A JP S57153020A
- Authority
- JP
- Japan
- Prior art keywords
- dose
- sec
- epoxy resin
- electron beams
- dose rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
Abstract
PURPOSE: A chemically stable water-dispersible resin composition excellent in adhesion, solvent resistance, water resistance, and processability, obtained by irradiating a mixture containing an epoxy resin and a nondissociable hydrophilic group-containing ethylenically unsaturated monomer with electron beams.
CONSTITUTION: A mixture consisting mainly of 50W95, pref., 60W90wt% epoxy resin and 5W40wt%, pref., 7W40wt% nondissociable hydrophilic group-containing ethylenically unsaturated monomer is irradiated with electron beams. When the amount of the epoxy resin is below 50wt%, the polymerization of the monomer is slow, whereas when it is above 90wt%, economy is poor. Irradiation with electron beams is carried out at a dose rate of 2/102W30Mrad/sec at a total dose of 0.1W30Mrad. When the dose rate is below 2/102Mrad/sec, dispersion is difficult, whereas when the dose rate is above 30Mrad/sec, the operation of equipments is impossible. When the dose is below 0.1Mrad, the amount of unreacted monomers is large, and a dose larger than 50Mrad is not necessary.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3922081A JPS57153020A (en) | 1981-03-18 | 1981-03-18 | Water-dispersible resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3922081A JPS57153020A (en) | 1981-03-18 | 1981-03-18 | Water-dispersible resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57153020A true JPS57153020A (en) | 1982-09-21 |
JPS6337805B2 JPS6337805B2 (en) | 1988-07-27 |
Family
ID=12547050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3922081A Granted JPS57153020A (en) | 1981-03-18 | 1981-03-18 | Water-dispersible resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57153020A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5219567A (en) * | 1975-08-05 | 1977-02-14 | Tamura Seisakusho Co Ltd | Specific ravity measuring unit |
JPS531285A (en) * | 1976-05-11 | 1978-01-09 | Scm Corp | Graft polymer composition |
JPS532587A (en) * | 1976-06-28 | 1978-01-11 | Shin Etsu Chem Co Ltd | Preparation of curable polymer |
JPS5357237A (en) * | 1976-11-05 | 1978-05-24 | Ricoh Co Ltd | Adhesive composition |
-
1981
- 1981-03-18 JP JP3922081A patent/JPS57153020A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5219567A (en) * | 1975-08-05 | 1977-02-14 | Tamura Seisakusho Co Ltd | Specific ravity measuring unit |
JPS531285A (en) * | 1976-05-11 | 1978-01-09 | Scm Corp | Graft polymer composition |
JPS532587A (en) * | 1976-06-28 | 1978-01-11 | Shin Etsu Chem Co Ltd | Preparation of curable polymer |
JPS5357237A (en) * | 1976-11-05 | 1978-05-24 | Ricoh Co Ltd | Adhesive composition |
Also Published As
Publication number | Publication date |
---|---|
JPS6337805B2 (en) | 1988-07-27 |
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