JPS57153020A - Water-dispersible resin composition - Google Patents

Water-dispersible resin composition

Info

Publication number
JPS57153020A
JPS57153020A JP3922081A JP3922081A JPS57153020A JP S57153020 A JPS57153020 A JP S57153020A JP 3922081 A JP3922081 A JP 3922081A JP 3922081 A JP3922081 A JP 3922081A JP S57153020 A JPS57153020 A JP S57153020A
Authority
JP
Japan
Prior art keywords
dose
sec
epoxy resin
electron beams
dose rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3922081A
Other languages
Japanese (ja)
Other versions
JPS6337805B2 (en
Inventor
Fumio Hosoi
Takashi Sasaki
Miyuki Hagiwara
Toru Takagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON GENSHIRYOKU KENKYUSHO
Japan Atomic Energy Agency
Original Assignee
NIPPON GENSHIRYOKU KENKYUSHO
Japan Atomic Energy Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON GENSHIRYOKU KENKYUSHO, Japan Atomic Energy Research Institute filed Critical NIPPON GENSHIRYOKU KENKYUSHO
Priority to JP3922081A priority Critical patent/JPS57153020A/en
Publication of JPS57153020A publication Critical patent/JPS57153020A/en
Publication of JPS6337805B2 publication Critical patent/JPS6337805B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

PURPOSE: A chemically stable water-dispersible resin composition excellent in adhesion, solvent resistance, water resistance, and processability, obtained by irradiating a mixture containing an epoxy resin and a nondissociable hydrophilic group-containing ethylenically unsaturated monomer with electron beams.
CONSTITUTION: A mixture consisting mainly of 50W95, pref., 60W90wt% epoxy resin and 5W40wt%, pref., 7W40wt% nondissociable hydrophilic group-containing ethylenically unsaturated monomer is irradiated with electron beams. When the amount of the epoxy resin is below 50wt%, the polymerization of the monomer is slow, whereas when it is above 90wt%, economy is poor. Irradiation with electron beams is carried out at a dose rate of 2/102W30Mrad/sec at a total dose of 0.1W30Mrad. When the dose rate is below 2/102Mrad/sec, dispersion is difficult, whereas when the dose rate is above 30Mrad/sec, the operation of equipments is impossible. When the dose is below 0.1Mrad, the amount of unreacted monomers is large, and a dose larger than 50Mrad is not necessary.
COPYRIGHT: (C)1982,JPO&Japio
JP3922081A 1981-03-18 1981-03-18 Water-dispersible resin composition Granted JPS57153020A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3922081A JPS57153020A (en) 1981-03-18 1981-03-18 Water-dispersible resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3922081A JPS57153020A (en) 1981-03-18 1981-03-18 Water-dispersible resin composition

Publications (2)

Publication Number Publication Date
JPS57153020A true JPS57153020A (en) 1982-09-21
JPS6337805B2 JPS6337805B2 (en) 1988-07-27

Family

ID=12547050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3922081A Granted JPS57153020A (en) 1981-03-18 1981-03-18 Water-dispersible resin composition

Country Status (1)

Country Link
JP (1) JPS57153020A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5219567A (en) * 1975-08-05 1977-02-14 Tamura Seisakusho Co Ltd Specific ravity measuring unit
JPS531285A (en) * 1976-05-11 1978-01-09 Scm Corp Graft polymer composition
JPS532587A (en) * 1976-06-28 1978-01-11 Shin Etsu Chem Co Ltd Preparation of curable polymer
JPS5357237A (en) * 1976-11-05 1978-05-24 Ricoh Co Ltd Adhesive composition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5219567A (en) * 1975-08-05 1977-02-14 Tamura Seisakusho Co Ltd Specific ravity measuring unit
JPS531285A (en) * 1976-05-11 1978-01-09 Scm Corp Graft polymer composition
JPS532587A (en) * 1976-06-28 1978-01-11 Shin Etsu Chem Co Ltd Preparation of curable polymer
JPS5357237A (en) * 1976-11-05 1978-05-24 Ricoh Co Ltd Adhesive composition

Also Published As

Publication number Publication date
JPS6337805B2 (en) 1988-07-27

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