JPS57119442A - Scanning electron microscope device - Google Patents

Scanning electron microscope device

Info

Publication number
JPS57119442A
JPS57119442A JP569981A JP569981A JPS57119442A JP S57119442 A JPS57119442 A JP S57119442A JP 569981 A JP569981 A JP 569981A JP 569981 A JP569981 A JP 569981A JP S57119442 A JPS57119442 A JP S57119442A
Authority
JP
Japan
Prior art keywords
sample
sample surface
electromagnetic
electron microscope
scanning electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP569981A
Other languages
Japanese (ja)
Inventor
Sachiko Hirota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP569981A priority Critical patent/JPS57119442A/en
Publication of JPS57119442A publication Critical patent/JPS57119442A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

PURPOSE:To make the device possible to observe a sample surface through the secondary electron image while the sample surface is not charged, by neutralizing the charge on the sample surface by generating glow discharge. CONSTITUTION:An incident electron beam 2 introduced from an electron gun 1 is focused step wise with two electromagnetic lenses comprising an electromagnetic focusing lens 3 and electromagnetic objective lens 5, and irradiated on a sample 7. When, the electron beam can scan two-dimensionally on the sample surface with a scanning coil 4 and auxiliary deflecting coil 6. Electrons emitted from the sample 7 are catched by a detector 9, and the secondary electron image of the sample surface is observed. A glow discharge generator 10 is provided in the vicinity of the sample 7, and charges on the sample 7 is neutralized by glow discharging.
JP569981A 1981-01-16 1981-01-16 Scanning electron microscope device Pending JPS57119442A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP569981A JPS57119442A (en) 1981-01-16 1981-01-16 Scanning electron microscope device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP569981A JPS57119442A (en) 1981-01-16 1981-01-16 Scanning electron microscope device

Publications (1)

Publication Number Publication Date
JPS57119442A true JPS57119442A (en) 1982-07-24

Family

ID=11618345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP569981A Pending JPS57119442A (en) 1981-01-16 1981-01-16 Scanning electron microscope device

Country Status (1)

Country Link
JP (1) JPS57119442A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0416549A2 (en) * 1989-09-04 1991-03-13 Tokyo Electron Limited Ion implantation equipment
EP0469314A2 (en) * 1990-07-31 1992-02-05 ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH Method and apparatus for neutralizing electric charges built up on a specimen in a vacuum chamber
US5352894A (en) * 1992-10-19 1994-10-04 Sharp Kabushiki Kaisha Electron spectroscopy analyzer and a method of correcting a shift of spectral line in electron spectroscopy
EP1296352A1 (en) * 2000-06-27 2003-03-26 Ebara Corporation Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus
JP2008191166A (en) * 2008-04-02 2008-08-21 Keio Gijuku Glow discharge drilling device and glow discharge drilling method
JP2020187873A (en) * 2019-05-10 2020-11-19 日本製鉄株式会社 Sample analysis method
JP2020187872A (en) * 2019-05-10 2020-11-19 日本製鉄株式会社 Sample analysis method

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0416549A2 (en) * 1989-09-04 1991-03-13 Tokyo Electron Limited Ion implantation equipment
US5089710A (en) * 1989-09-04 1992-02-18 Tokyo Electron Limited Ion implantation equipment
EP0469314A2 (en) * 1990-07-31 1992-02-05 ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH Method and apparatus for neutralizing electric charges built up on a specimen in a vacuum chamber
US5352894A (en) * 1992-10-19 1994-10-04 Sharp Kabushiki Kaisha Electron spectroscopy analyzer and a method of correcting a shift of spectral line in electron spectroscopy
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
EP1296352A4 (en) * 2000-06-27 2007-04-18 Ebara Corp Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus
EP1296352A1 (en) * 2000-06-27 2003-03-26 Ebara Corporation Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus
US7411191B2 (en) 2000-06-27 2008-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8053726B2 (en) 2000-06-27 2011-11-08 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8368031B2 (en) 2000-06-27 2013-02-05 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8803103B2 (en) 2000-06-27 2014-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US9368314B2 (en) 2000-06-27 2016-06-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
JP2008191166A (en) * 2008-04-02 2008-08-21 Keio Gijuku Glow discharge drilling device and glow discharge drilling method
JP2020187873A (en) * 2019-05-10 2020-11-19 日本製鉄株式会社 Sample analysis method
JP2020187872A (en) * 2019-05-10 2020-11-19 日本製鉄株式会社 Sample analysis method

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