JPS57118238A - Positive type photosensitive composition - Google Patents
Positive type photosensitive compositionInfo
- Publication number
- JPS57118238A JPS57118238A JP377981A JP377981A JPS57118238A JP S57118238 A JPS57118238 A JP S57118238A JP 377981 A JP377981 A JP 377981A JP 377981 A JP377981 A JP 377981A JP S57118238 A JPS57118238 A JP S57118238A
- Authority
- JP
- Japan
- Prior art keywords
- composition
- plate
- photosensitive composition
- dot
- type photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 abstract 3
- 230000035945 sensitivity Effects 0.000 abstract 2
- -1 1,4-naphthoquinone compound Chemical class 0.000 abstract 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract 1
- 125000002252 acyl group Chemical group 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 1
- 230000001603 reducing effect Effects 0.000 abstract 1
- 125000003107 substituted aryl group Chemical group 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP377981A JPS57118238A (en) | 1981-01-16 | 1981-01-16 | Positive type photosensitive composition |
| US06/336,861 US4460674A (en) | 1981-01-16 | 1982-01-04 | Posi-type quinone diazide photosensitive composition with sensitizer therefor |
| DE19823201151 DE3201151A1 (de) | 1981-01-16 | 1982-01-15 | Positive lichtempfindliche masse und diese enthaltendes positives lichtempfindliches aufzeichnungsmaterial |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP377981A JPS57118238A (en) | 1981-01-16 | 1981-01-16 | Positive type photosensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57118238A true JPS57118238A (en) | 1982-07-23 |
| JPS6358336B2 JPS6358336B2 (enrdf_load_stackoverflow) | 1988-11-15 |
Family
ID=11566666
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP377981A Granted JPS57118238A (en) | 1981-01-16 | 1981-01-16 | Positive type photosensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57118238A (enrdf_load_stackoverflow) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5254503A (en) * | 1975-10-25 | 1977-05-04 | Hoechst Ag | Photoosensitive copying material |
| JPS566236A (en) * | 1979-06-28 | 1981-01-22 | Fuji Photo Film Co Ltd | Photosensitive material and pattern forming method using it |
-
1981
- 1981-01-16 JP JP377981A patent/JPS57118238A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5254503A (en) * | 1975-10-25 | 1977-05-04 | Hoechst Ag | Photoosensitive copying material |
| JPS566236A (en) * | 1979-06-28 | 1981-01-22 | Fuji Photo Film Co Ltd | Photosensitive material and pattern forming method using it |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6358336B2 (enrdf_load_stackoverflow) | 1988-11-15 |
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