JPS57115548A - Photosensitive printing plate - Google Patents

Photosensitive printing plate

Info

Publication number
JPS57115548A
JPS57115548A JP5405580A JP5405580A JPS57115548A JP S57115548 A JPS57115548 A JP S57115548A JP 5405580 A JP5405580 A JP 5405580A JP 5405580 A JP5405580 A JP 5405580A JP S57115548 A JPS57115548 A JP S57115548A
Authority
JP
Japan
Prior art keywords
layer
particle size
printing plate
photosensitive
silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5405580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6119027B2 (enrdf_load_stackoverflow
Inventor
Akira Nagashima
Nobuyuki Kita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP5405580A priority Critical patent/JPS57115548A/ja
Publication of JPS57115548A publication Critical patent/JPS57115548A/ja
Publication of JPS6119027B2 publication Critical patent/JPS6119027B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5405580A 1980-04-23 1980-04-23 Photosensitive printing plate Granted JPS57115548A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5405580A JPS57115548A (en) 1980-04-23 1980-04-23 Photosensitive printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5405580A JPS57115548A (en) 1980-04-23 1980-04-23 Photosensitive printing plate

Publications (2)

Publication Number Publication Date
JPS57115548A true JPS57115548A (en) 1982-07-19
JPS6119027B2 JPS6119027B2 (enrdf_load_stackoverflow) 1986-05-15

Family

ID=12959923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5405580A Granted JPS57115548A (en) 1980-04-23 1980-04-23 Photosensitive printing plate

Country Status (1)

Country Link
JP (1) JPS57115548A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61252546A (ja) * 1985-05-01 1986-11-10 Ueno Kagaku Kogyo Kk 感光性レジストインク，それを用いたｐｓ板の製造方法およびそのｐｓ板の蝕刻方法
JPS6370841A (ja) * 1986-09-12 1988-03-31 Kimoto & Co Ltd 非銀塩画像形成材料
JPS63146045A (ja) * 1986-09-18 1988-06-18 ナップ．システムズ（ユー．エス．エー）インコーポレイテッド 艶消面を有する光重合性印刷版
US5576137A (en) * 1993-10-18 1996-11-19 Agfa-Gevaert Ag Matted, radiation-sensitive recording material and printing plate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06173238A (ja) * 1992-03-13 1994-06-21 Kiyooc Kk 畦カバー

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61252546A (ja) * 1985-05-01 1986-11-10 Ueno Kagaku Kogyo Kk 感光性レジストインク，それを用いたｐｓ板の製造方法およびそのｐｓ板の蝕刻方法
JPS6370841A (ja) * 1986-09-12 1988-03-31 Kimoto & Co Ltd 非銀塩画像形成材料
JPS63146045A (ja) * 1986-09-18 1988-06-18 ナップ．システムズ（ユー．エス．エー）インコーポレイテッド 艶消面を有する光重合性印刷版
US5576137A (en) * 1993-10-18 1996-11-19 Agfa-Gevaert Ag Matted, radiation-sensitive recording material and printing plate

Also Published As

Publication number Publication date
JPS6119027B2 (enrdf_load_stackoverflow) 1986-05-15

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