JPS57114233A - Electron beam drawing system - Google Patents

Electron beam drawing system

Info

Publication number
JPS57114233A
JPS57114233A JP56179094A JP17909481A JPS57114233A JP S57114233 A JPS57114233 A JP S57114233A JP 56179094 A JP56179094 A JP 56179094A JP 17909481 A JP17909481 A JP 17909481A JP S57114233 A JPS57114233 A JP S57114233A
Authority
JP
Japan
Prior art keywords
electron beam
beam drawing
drawing system
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56179094A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0322049B2 (cg-RX-API-DMAC10.html
Inventor
Matsuku Arufuretsudo
Korinzu Ooneiru Buraian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS57114233A publication Critical patent/JPS57114233A/ja
Publication of JPH0322049B2 publication Critical patent/JPH0322049B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/3308—
    • H10P72/7612—
    • H10P72/7626—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Electron Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP56179094A 1980-12-24 1981-11-10 Electron beam drawing system Granted JPS57114233A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/219,658 US4382739A (en) 1980-12-24 1980-12-24 Light actuating force elevator drive mechanism

Publications (2)

Publication Number Publication Date
JPS57114233A true JPS57114233A (en) 1982-07-16
JPH0322049B2 JPH0322049B2 (cg-RX-API-DMAC10.html) 1991-03-26

Family

ID=22820184

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56179094A Granted JPS57114233A (en) 1980-12-24 1981-11-10 Electron beam drawing system

Country Status (4)

Country Link
US (1) US4382739A (cg-RX-API-DMAC10.html)
EP (1) EP0054624B1 (cg-RX-API-DMAC10.html)
JP (1) JPS57114233A (cg-RX-API-DMAC10.html)
DE (1) DE3169064D1 (cg-RX-API-DMAC10.html)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4592926A (en) * 1984-05-21 1986-06-03 Machine Technology, Inc. Processing apparatus and method
DE3788973T2 (de) * 1986-04-04 1994-08-11 Materials Research Corp Verfahren und Vorrichtung zur Handhabung und Behandlung von scheibenartigen Materialien.
KR100303075B1 (ko) * 1992-11-06 2001-11-30 조셉 제이. 스위니 집적회로 웨이퍼 이송 방법 및 장치
US5397214A (en) * 1993-06-11 1995-03-14 Cheung; Yau T. Apparatus for handling thin, flexible sheets of material
US5540821A (en) * 1993-07-16 1996-07-30 Applied Materials, Inc. Method and apparatus for adjustment of spacing between wafer and PVD target during semiconductor processing
US5855465A (en) * 1996-04-16 1999-01-05 Gasonics International Semiconductor wafer processing carousel
US5863170A (en) * 1996-04-16 1999-01-26 Gasonics International Modular process system
US5992239A (en) * 1998-09-10 1999-11-30 Boehringer Laboratories, Inc. Gauge
EP1000889B1 (de) * 1998-11-04 2002-08-14 AT Anlagetechnik AG Vorrichtung zum Uebertragen fliessfähigen Materials
US20050238463A1 (en) * 2003-08-01 2005-10-27 Smith Harlan B Method and apparatus for handling pipe and other materials
US8033245B2 (en) * 2004-02-12 2011-10-11 Applied Materials, Inc. Substrate support bushing
CN100587104C (zh) * 2004-03-26 2010-02-03 日新电机株式会社 硅膜形成装置
US7731778B2 (en) * 2006-03-27 2010-06-08 Magnesium Technologies Corporation Scrap bale for steel making process
US20100068011A1 (en) * 2006-12-05 2010-03-18 Shimadzu Corporation Pallet conveyance device and substrate inspection device
CN104619124B (zh) * 2015-01-22 2018-03-09 咸阳威迪机电科技有限公司 一种适应各种脆性材料线路板的真空压合机
CN108896595B (zh) * 2018-06-15 2020-11-17 昆明理工大学 一种保护探头的扫描电镜试样台
DE102018009871A1 (de) * 2018-12-19 2020-06-25 Vat Holding Ag Stifthubvorrichtung mit Zustandsüberwachung
JP2023115438A (ja) * 2022-02-08 2023-08-21 株式会社ディスコ 洗浄装置
CN114807906B (zh) * 2022-06-27 2022-09-16 江苏邑文微电子科技有限公司 一种原子层沉积设备

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1136140A (en) * 1914-09-09 1915-04-20 Standard Plunger Elevator Company Hydraulic elevator.
US3968885A (en) * 1973-06-29 1976-07-13 International Business Machines Corporation Method and apparatus for handling workpieces
DE2529018A1 (de) 1975-06-28 1977-01-13 Ibm Deutschland Einrichtung zur automatischen einzelfoerderung von werkstuecken in eine unter unterdruck stehende bearbeitungsstation
JPS5548598A (en) * 1978-09-29 1980-04-07 Fujitsu Fanuc Ltd Load reducing device of industrial robot

Also Published As

Publication number Publication date
US4382739A (en) 1983-05-10
EP0054624A1 (en) 1982-06-30
JPH0322049B2 (cg-RX-API-DMAC10.html) 1991-03-26
EP0054624B1 (en) 1985-02-20
DE3169064D1 (en) 1985-03-28

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