JPS5710579B2 - - Google Patents

Info

Publication number
JPS5710579B2
JPS5710579B2 JP12197176A JP12197176A JPS5710579B2 JP S5710579 B2 JPS5710579 B2 JP S5710579B2 JP 12197176 A JP12197176 A JP 12197176A JP 12197176 A JP12197176 A JP 12197176A JP S5710579 B2 JPS5710579 B2 JP S5710579B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12197176A
Other languages
Japanese (ja)
Other versions
JPS5248977A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5248977A publication Critical patent/JPS5248977A/ja
Publication of JPS5710579B2 publication Critical patent/JPS5710579B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76897Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
JP51121971A 1975-10-15 1976-10-13 Method of manufacturing semiconductor device Granted JPS5248977A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7531520A FR2328284A1 (fr) 1975-10-15 1975-10-15 Diode fonctionnant dans le domaine des ondes millimetriques et son procede de fabrication

Publications (2)

Publication Number Publication Date
JPS5248977A JPS5248977A (en) 1977-04-19
JPS5710579B2 true JPS5710579B2 (enExample) 1982-02-26

Family

ID=9161218

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51121971A Granted JPS5248977A (en) 1975-10-15 1976-10-13 Method of manufacturing semiconductor device

Country Status (7)

Country Link
US (1) US4052269A (enExample)
JP (1) JPS5248977A (enExample)
AU (1) AU500263B2 (enExample)
CA (1) CA1068012A (enExample)
DE (1) DE2645425A1 (enExample)
FR (1) FR2328284A1 (enExample)
GB (1) GB1557808A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4168213A (en) * 1976-04-29 1979-09-18 U.S. Philips Corporation Field emission device and method of forming same
IT1068248B (it) * 1976-11-16 1985-03-21 Selenia Ind Elettroniche Procedimento per la realizzazione di dispositivi a semiconduttore passivati con dissipatore di calore integrato
JPS55110038A (en) * 1979-02-19 1980-08-25 Nippon Telegr & Teleph Corp <Ntt> Method for making electrode
US4759822A (en) * 1984-10-12 1988-07-26 Triquint Semiconductor Inc. Methods for producing an aperture in a surface
WO2025023859A1 (ru) * 2023-07-24 2025-01-30 Общество с ограниченной ответственностью "Терагерцовая фотоника" Детектор терагерцового излучения

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1952632A1 (de) * 1969-10-18 1971-04-22 Licentia Gmbh Verfahren zum Herstellen einer Diffusionszone
BE792908A (fr) * 1971-12-20 1973-04-16 Western Electric Co Procede de fabrication de dispositifs semi-conducteurs
JPS4885440A (enExample) * 1972-02-18 1973-11-13
US3880684A (en) * 1973-08-03 1975-04-29 Mitsubishi Electric Corp Process for preparing semiconductor

Also Published As

Publication number Publication date
AU1865276A (en) 1978-04-20
CA1068012A (en) 1979-12-11
US4052269A (en) 1977-10-04
DE2645425A1 (de) 1977-04-28
AU500263B2 (en) 1979-05-17
FR2328284B1 (enExample) 1982-09-10
JPS5248977A (en) 1977-04-19
FR2328284A1 (fr) 1977-05-13
GB1557808A (en) 1979-12-12

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