JPS5690524A - Inspection of pattern defect - Google Patents

Inspection of pattern defect

Info

Publication number
JPS5690524A
JPS5690524A JP16778279A JP16778279A JPS5690524A JP S5690524 A JPS5690524 A JP S5690524A JP 16778279 A JP16778279 A JP 16778279A JP 16778279 A JP16778279 A JP 16778279A JP S5690524 A JPS5690524 A JP S5690524A
Authority
JP
Japan
Prior art keywords
inspection
inspected
added
output
signals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16778279A
Other languages
Japanese (ja)
Other versions
JPS5750050B2 (en
Inventor
Kenji Kurihara
Kunio Saito
Bunjirou Tsujiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP16778279A priority Critical patent/JPS5690524A/en
Publication of JPS5690524A publication Critical patent/JPS5690524A/en
Publication of JPS5750050B2 publication Critical patent/JPS5750050B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To perform defect inspection with high precision by means of simple constitution by a method wherein a pattern region to be inspected is scanned by means of a pickup tube, the signals gained is made binary to be added to a logic circuit for inspection through the shift register column. CONSTITUTION:A pattern body to be inspected 1, whereon a pattern region to be inspected A is formed, is placed on a stand 3 driven by a driving mechanism 2, the means 4 consisting of a pickup tube 8 for gaining the image signals is arranged opposing thereto, further a lighting means 7 for irradiating the region A is prepared. Further for knowing a relative position to the means 4 a position signal generating device consisting of a laser interferometer is prepared to supply said output to a computor device 6 thereby to control the device 2. Next, the output of the means 4 is added to a binary circuit 9 to supply said signals through a shift register column 10 to a logic circuit for inspection 12, the output gained is added to the computor device 6 to indicate the existence of defect on an indication device.
JP16778279A 1979-12-24 1979-12-24 Inspection of pattern defect Granted JPS5690524A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16778279A JPS5690524A (en) 1979-12-24 1979-12-24 Inspection of pattern defect

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16778279A JPS5690524A (en) 1979-12-24 1979-12-24 Inspection of pattern defect

Publications (2)

Publication Number Publication Date
JPS5690524A true JPS5690524A (en) 1981-07-22
JPS5750050B2 JPS5750050B2 (en) 1982-10-25

Family

ID=15856003

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16778279A Granted JPS5690524A (en) 1979-12-24 1979-12-24 Inspection of pattern defect

Country Status (1)

Country Link
JP (1) JPS5690524A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2524162A1 (en) * 1982-03-23 1983-09-30 Canon Kk APPARATUS AND METHOD FOR CONTROLLING NEGATIVES AND DEVICE FOR MASKING MASKS

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2524162A1 (en) * 1982-03-23 1983-09-30 Canon Kk APPARATUS AND METHOD FOR CONTROLLING NEGATIVES AND DEVICE FOR MASKING MASKS

Also Published As

Publication number Publication date
JPS5750050B2 (en) 1982-10-25

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