JPS5684450A - Manufacture of noncrystalline alloy thin strip of small alternate current loss - Google Patents

Manufacture of noncrystalline alloy thin strip of small alternate current loss

Info

Publication number
JPS5684450A
JPS5684450A JP16088679A JP16088679A JPS5684450A JP S5684450 A JPS5684450 A JP S5684450A JP 16088679 A JP16088679 A JP 16088679A JP 16088679 A JP16088679 A JP 16088679A JP S5684450 A JPS5684450 A JP S5684450A
Authority
JP
Japan
Prior art keywords
thin strip
magnetic
magnetic field
current loss
alloy thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16088679A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0151540B2 (enrdf_load_stackoverflow
Inventor
Hiroyasu Fujimori
Hiroaki Morita
Hideki Yoshimoto
Takeshi Masumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Research Development Corp of Japan
Shingijutsu Kaihatsu Jigyodan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Development Corp of Japan, Shingijutsu Kaihatsu Jigyodan filed Critical Research Development Corp of Japan
Priority to JP16088679A priority Critical patent/JPS5684450A/ja
Publication of JPS5684450A publication Critical patent/JPS5684450A/ja
Publication of JPH0151540B2 publication Critical patent/JPH0151540B2/ja
Granted legal-status Critical Current

Links

JP16088679A 1979-12-13 1979-12-13 Manufacture of noncrystalline alloy thin strip of small alternate current loss Granted JPS5684450A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16088679A JPS5684450A (en) 1979-12-13 1979-12-13 Manufacture of noncrystalline alloy thin strip of small alternate current loss

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16088679A JPS5684450A (en) 1979-12-13 1979-12-13 Manufacture of noncrystalline alloy thin strip of small alternate current loss

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP9047684A Division JPS59211530A (ja) 1984-05-07 1984-05-07 交流損失の小さいＦｅ−Ｃｏ−Ｓｉ−Ｂ系非晶質合金薄帯の製造方法

Publications (2)

Publication Number Publication Date
JPS5684450A true JPS5684450A (en) 1981-07-09
JPH0151540B2 JPH0151540B2 (enrdf_load_stackoverflow) 1989-11-06

Family

ID=15724484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16088679A Granted JPS5684450A (en) 1979-12-13 1979-12-13 Manufacture of noncrystalline alloy thin strip of small alternate current loss

Country Status (1)

Country Link
JP (1) JPS5684450A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62276810A (ja) * 1986-02-24 1987-12-01 Toshiba Corp 高透磁率磁心の製造方法
CN113652616A (zh) * 2021-07-01 2021-11-16 中国电子科技集团公司第九研究所 一种高性能软磁非晶涂层及其制备方法
CN113755713A (zh) * 2020-07-17 2021-12-07 英迪那米(徐州)半导体科技有限公司 一种三氧化二钇弥散强化铜合金的制备方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62276810A (ja) * 1986-02-24 1987-12-01 Toshiba Corp 高透磁率磁心の製造方法
CN113755713A (zh) * 2020-07-17 2021-12-07 英迪那米(徐州)半导体科技有限公司 一种三氧化二钇弥散强化铜合金的制备方法
CN113652616A (zh) * 2021-07-01 2021-11-16 中国电子科技集团公司第九研究所 一种高性能软磁非晶涂层及其制备方法
CN113652616B (zh) * 2021-07-01 2022-08-09 中国电子科技集团公司第九研究所 一种高性能软磁非晶涂层及其制备方法

Also Published As

Publication number Publication date
JPH0151540B2 (enrdf_load_stackoverflow) 1989-11-06

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