JPS5673579A - Production of coated object - Google Patents

Production of coated object

Info

Publication number
JPS5673579A
JPS5673579A JP14979279A JP14979279A JPS5673579A JP S5673579 A JPS5673579 A JP S5673579A JP 14979279 A JP14979279 A JP 14979279A JP 14979279 A JP14979279 A JP 14979279A JP S5673579 A JPS5673579 A JP S5673579A
Authority
JP
Japan
Prior art keywords
liquid
coated
opening
nozzle
thick film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14979279A
Other languages
Japanese (ja)
Other versions
JPS591391B2 (en
Inventor
Isamu Uchida
Kiyoshi Kurihara
Tomohisa Okuaki
Hideyuki Hayakawa
Masashi Gamo
Kazuma Aizawa
Toshio Tajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP14979279A priority Critical patent/JPS591391B2/en
Publication of JPS5673579A publication Critical patent/JPS5673579A/en
Publication of JPS591391B2 publication Critical patent/JPS591391B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1039—Recovery of excess liquid or other fluent material; Controlling means therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE:To prevent the clogging of nozzle tip despite long-time coating by ejecting liquid from the central part of a suction nozzle which sucks coating liquid to the coated thick film part and sucking this liquid together with the coating liquid of the coated thick film part. CONSTITUTION:An opening 2 for suction is diametrally opposed to the thick film part 11 at the edge of the coated matter coated on a substrate 12 and a suction nozzle 1b is fixed to the position in contact with the coating liquid, thence the rear end of a liquid ejection nozzle 4 and the storage vessel for the liquid to be supplied are connected to the discharge port of a pump by means of conduit. An opening 3 for discharge is connected to a pressure reducing device. When the liquid is sucked from the opening 3 for discharge while warm water is being supplied to the nozzle 4, the coating liquid of the thick film part 11 of the coated part moving just before the opening 2 for suction is sucked together with the warm water which is being ejected, through the opening 2 for suction, whereby the coating liquid of the thick film part 11 of the coated edge is removed. It is equally well to connect the nozzle 4 simply to a warm water tank by means of a conduit.
JP14979279A 1979-11-19 1979-11-19 Manufacturing method of applied product Expired JPS591391B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14979279A JPS591391B2 (en) 1979-11-19 1979-11-19 Manufacturing method of applied product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14979279A JPS591391B2 (en) 1979-11-19 1979-11-19 Manufacturing method of applied product

Publications (2)

Publication Number Publication Date
JPS5673579A true JPS5673579A (en) 1981-06-18
JPS591391B2 JPS591391B2 (en) 1984-01-11

Family

ID=15482810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14979279A Expired JPS591391B2 (en) 1979-11-19 1979-11-19 Manufacturing method of applied product

Country Status (1)

Country Link
JP (1) JPS591391B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0139211A2 (en) * 1983-09-12 1985-05-02 Fuji Photo Film Co., Ltd. Suction nozzle
JPS6394437U (en) * 1986-12-10 1988-06-17
JPH0299166A (en) * 1988-10-04 1990-04-11 Fuji Photo Film Co Ltd Suction treatment of edge part of coating layer and suction nozzle
US4933215A (en) * 1986-08-07 1990-06-12 Fuji Photo Film Co., Ltd. Method and apparatus for coating webs
JPH07299410A (en) * 1995-01-30 1995-11-14 Fuji Photo Film Co Ltd Suction nozzle which executes suction treatment of edge of coating layer
EP0774301A1 (en) * 1995-10-19 1997-05-21 Minnesota Mining And Manufacturing Company Apparatus for removing material from a coated moving web and coating apparatus using such apparatus
US6793764B1 (en) 1996-02-27 2004-09-21 Micron Technology, Inc. Chemical dispensing system for semiconductor wafer processing
CN103008179A (en) * 2011-09-22 2013-04-03 富士胶片株式会社 Coating device and coating method
JP5956053B2 (en) * 2013-02-14 2016-07-20 株式会社島津製作所 Surface chemical processing equipment for fine patterning

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0139211A2 (en) * 1983-09-12 1985-05-02 Fuji Photo Film Co., Ltd. Suction nozzle
US4933215A (en) * 1986-08-07 1990-06-12 Fuji Photo Film Co., Ltd. Method and apparatus for coating webs
JPS6394437U (en) * 1986-12-10 1988-06-17
JPH0425259Y2 (en) * 1986-12-10 1992-06-16
JPH0299166A (en) * 1988-10-04 1990-04-11 Fuji Photo Film Co Ltd Suction treatment of edge part of coating layer and suction nozzle
JPH0611422B2 (en) * 1988-10-04 1994-02-16 富士写真フイルム株式会社 Suction processing method and suction nozzle for coating layer edge portion
JPH07299410A (en) * 1995-01-30 1995-11-14 Fuji Photo Film Co Ltd Suction nozzle which executes suction treatment of edge of coating layer
EP0774301A1 (en) * 1995-10-19 1997-05-21 Minnesota Mining And Manufacturing Company Apparatus for removing material from a coated moving web and coating apparatus using such apparatus
US5755881A (en) * 1995-10-19 1998-05-26 Minnesota Mining And Manufacturing Company Apparatus for removing material from a coated moving web and coating apparatus using such apparatus
US6793764B1 (en) 1996-02-27 2004-09-21 Micron Technology, Inc. Chemical dispensing system for semiconductor wafer processing
US7470344B1 (en) 1996-02-27 2008-12-30 Micron Technology, Inc. Chemical dispensing system for semiconductor wafer processing
CN103008179A (en) * 2011-09-22 2013-04-03 富士胶片株式会社 Coating device and coating method
JP2013066851A (en) * 2011-09-22 2013-04-18 Fujifilm Corp Coating apparatus and coating mehtod
CN103008179B (en) * 2011-09-22 2016-08-17 富士胶片株式会社 Applying device and coating method
JP5956053B2 (en) * 2013-02-14 2016-07-20 株式会社島津製作所 Surface chemical processing equipment for fine patterning

Also Published As

Publication number Publication date
JPS591391B2 (en) 1984-01-11

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