JPS5669877A - Manufacture of luminous element - Google Patents

Manufacture of luminous element

Info

Publication number
JPS5669877A
JPS5669877A JP14543179A JP14543179A JPS5669877A JP S5669877 A JPS5669877 A JP S5669877A JP 14543179 A JP14543179 A JP 14543179A JP 14543179 A JP14543179 A JP 14543179A JP S5669877 A JPS5669877 A JP S5669877A
Authority
JP
Japan
Prior art keywords
added
layer
epitaxial layer
type
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14543179A
Other languages
Japanese (ja)
Other versions
JPS6019156B2 (en
Inventor
Yoshio Iizuka
Fumiaki Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP54145431A priority Critical patent/JPS6019156B2/en
Publication of JPS5669877A publication Critical patent/JPS5669877A/en
Publication of JPS6019156B2 publication Critical patent/JPS6019156B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0062Processes for devices with an active region comprising only III-V compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To obtain a green LED with high brightness by a method wherein C is used as P type impurities of GaP and C is added from the gaseous phase when a liquid phase grows. CONSTITUTION:An N type GaP wafer 10 is coated with a liquid-phase growing layer 10', the layer 10' is slowly cooled, and a liquid phase is grown. When the layer 10' is slowly cooled up to 970 deg.C in H2, quartz is reduced, and added into Si and Ga, and the first N epitaxial layer is grown. H2 is changed into Ar, NH3 and CH4 are added, the whole is kept at a fixed temperature, and N and C are added into Ga. A P type second epitaxial layer to which N and C are added is further formed by means of slow cooling. Si in Ga is reacted with N and removed at that time. Zn is added from the gaseous phase, and a P type third epitaxial layer is stacked. When the concentration of CH4 is controlled in case of the formation of the second epitaxial layer, an acceptor is easily controlled, and a green LED having high brightness and high efficiency is obtained.
JP54145431A 1979-11-12 1979-11-12 Manufacturing method of light emitting device Expired JPS6019156B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54145431A JPS6019156B2 (en) 1979-11-12 1979-11-12 Manufacturing method of light emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54145431A JPS6019156B2 (en) 1979-11-12 1979-11-12 Manufacturing method of light emitting device

Publications (2)

Publication Number Publication Date
JPS5669877A true JPS5669877A (en) 1981-06-11
JPS6019156B2 JPS6019156B2 (en) 1985-05-14

Family

ID=15385078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54145431A Expired JPS6019156B2 (en) 1979-11-12 1979-11-12 Manufacturing method of light emitting device

Country Status (1)

Country Link
JP (1) JPS6019156B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101414235B1 (en) * 2012-06-25 2014-07-01 주식회사 구마이엔씨 Reparing method for conduit using changeable reparing device

Also Published As

Publication number Publication date
JPS6019156B2 (en) 1985-05-14

Similar Documents

Publication Publication Date Title
US3956032A (en) Process for fabricating SiC semiconductor devices
US4897149A (en) Method of fabricating single-crystal substrates of silicon carbide
US4315796A (en) Crystal growth of compound semiconductor mixed crystals under controlled vapor pressure
JPS60145992A (en) Preparation of silicon carbide single crystal base
US4504329A (en) Process for the epitaxial deposition of III-V compounds utilizing a binary alloy as the metallic source
JP4768975B2 (en) GaN crystal and GaN crystal substrate manufacturing method
JPS581539B2 (en) epitaxial wafer
JPS5922374A (en) Manufacture of green light-emitting diode
JPS5669877A (en) Manufacture of luminous element
JPS61243000A (en) Production of substrate of silicon carbide single crystal
JPS61291495A (en) Production of silicon carbide single crystal base
JPS61106497A (en) Method for growing epitaxial film of gallium phosphide and arsenide
JPS5624985A (en) Manufacture of gallium phosphide green light emitting element
JPS59137400A (en) P type gallium arsenide single crystal with low dislocation density and its manufacture
JPH0248495A (en) Method for growing silicon carbide single crystal
JPS59214276A (en) Manufacture of gallium phosphide green light-emitting element
JPH0380197A (en) Production of single crystal of semiconductor sic
JPS58115818A (en) Growing method of silicon carbide epitaxial film
JPH02141498A (en) Method for growing ingap crystal
JPS6185822A (en) Liquid epitaxial growth process of sic single crystal
JPS61222992A (en) Production of single crystal substrate of silicon carbide
JPH1197740A (en) Epitaxial wafer for gap light emitting diode and gap light emitting diode
JPS5768019A (en) Gas phase growing method
JPS59128299A (en) Manufacture of single crystal of aluminum indium phosphide
JPH0697656B2 (en) Vapor phase epitaxial growth method