JPS5669628A - Developer composition for lithographic plate - Google Patents

Developer composition for lithographic plate

Info

Publication number
JPS5669628A
JPS5669628A JP14499279A JP14499279A JPS5669628A JP S5669628 A JPS5669628 A JP S5669628A JP 14499279 A JP14499279 A JP 14499279A JP 14499279 A JP14499279 A JP 14499279A JP S5669628 A JPS5669628 A JP S5669628A
Authority
JP
Japan
Prior art keywords
developer composition
lithographic plate
tetrahydrofurfuryl alcohol
composition
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14499279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6116058B2 (enrdf_load_stackoverflow
Inventor
Shigeki Shimizu
Koji Ide
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP14499279A priority Critical patent/JPS5669628A/ja
Publication of JPS5669628A publication Critical patent/JPS5669628A/ja
Publication of JPS6116058B2 publication Critical patent/JPS6116058B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP14499279A 1979-11-09 1979-11-09 Developer composition for lithographic plate Granted JPS5669628A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14499279A JPS5669628A (en) 1979-11-09 1979-11-09 Developer composition for lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14499279A JPS5669628A (en) 1979-11-09 1979-11-09 Developer composition for lithographic plate

Publications (2)

Publication Number Publication Date
JPS5669628A true JPS5669628A (en) 1981-06-11
JPS6116058B2 JPS6116058B2 (enrdf_load_stackoverflow) 1986-04-28

Family

ID=15374950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14499279A Granted JPS5669628A (en) 1979-11-09 1979-11-09 Developer composition for lithographic plate

Country Status (1)

Country Link
JP (1) JPS5669628A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023178504A (ja) * 2022-05-24 2023-12-15 東京インキ株式会社 無処理版用現像液および現像された無処理版の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0377748U (enrdf_load_stackoverflow) * 1989-11-30 1991-08-06

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023178504A (ja) * 2022-05-24 2023-12-15 東京インキ株式会社 無処理版用現像液および現像された無処理版の製造方法

Also Published As

Publication number Publication date
JPS6116058B2 (enrdf_load_stackoverflow) 1986-04-28

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