JPS5669070A - Electrolytic polishing apparatus - Google Patents

Electrolytic polishing apparatus

Info

Publication number
JPS5669070A
JPS5669070A JP14546879A JP14546879A JPS5669070A JP S5669070 A JPS5669070 A JP S5669070A JP 14546879 A JP14546879 A JP 14546879A JP 14546879 A JP14546879 A JP 14546879A JP S5669070 A JPS5669070 A JP S5669070A
Authority
JP
Japan
Prior art keywords
cavity
working fluid
abrasive
elastic substance
worked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14546879A
Other languages
Japanese (ja)
Other versions
JPS6211965B2 (en
Inventor
Kiyoshi Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Inoue Japax Research Inc
Original Assignee
Inoue Japax Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inoue Japax Research Inc filed Critical Inoue Japax Research Inc
Priority to JP14546879A priority Critical patent/JPS5669070A/en
Publication of JPS5669070A publication Critical patent/JPS5669070A/en
Publication of JPS6211965B2 publication Critical patent/JPS6211965B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

PURPOSE: To improve electrolytic polishing in efficiency by covering the cavity to be finished with an elastic substance and moving the abrasive-containing working fluid sealed in the cavity in order to allow the abrasive to remove the oxide film on the surface being finished.
CONSTITUTION: An object 2 to be worked is secured on a table 1. An elastic substance 4 is arranged so as to cover the cavity to be worked, and closely secured by a fixing member 6. The sealed cavity is filled with working fluid containing abrasive supplied from a working fluid regulating tank 1 by a pump 12 through a supply pipe 9 having a check valve 11 and a supply passage 7. Then a surface 5 is electrolytically polished by using a flexible electrode as a cathode and the object 2 as an anode. On doing this, the reciprocating motion of a pressure substance 19 causes the elastic substance 4 to be pressed downwards, and consequently the working fluid cyclically moves in the cavity. The movement permits the oxide film to be removed and exhausted through an exhaust passage 8.
COPYRIGHT: (C)1981,JPO&Japio
JP14546879A 1979-11-12 1979-11-12 Electrolytic polishing apparatus Granted JPS5669070A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14546879A JPS5669070A (en) 1979-11-12 1979-11-12 Electrolytic polishing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14546879A JPS5669070A (en) 1979-11-12 1979-11-12 Electrolytic polishing apparatus

Publications (2)

Publication Number Publication Date
JPS5669070A true JPS5669070A (en) 1981-06-10
JPS6211965B2 JPS6211965B2 (en) 1987-03-16

Family

ID=15385929

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14546879A Granted JPS5669070A (en) 1979-11-12 1979-11-12 Electrolytic polishing apparatus

Country Status (1)

Country Link
JP (1) JPS5669070A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005508074A (en) * 2001-03-14 2005-03-24 アプライド マテリアルズ インコーポレイテッド Substrate planarization using electrolytic chemical mechanical polishing
WO2022253927A1 (en) * 2021-06-01 2022-12-08 University College Dublin, National University Of Ireland, Dublin Hybrid electrochemical and abrasive fluid polishing

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5031866A (en) * 1973-07-20 1975-03-28

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5031866A (en) * 1973-07-20 1975-03-28

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005508074A (en) * 2001-03-14 2005-03-24 アプライド マテリアルズ インコーポレイテッド Substrate planarization using electrolytic chemical mechanical polishing
WO2022253927A1 (en) * 2021-06-01 2022-12-08 University College Dublin, National University Of Ireland, Dublin Hybrid electrochemical and abrasive fluid polishing

Also Published As

Publication number Publication date
JPS6211965B2 (en) 1987-03-16

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