JPS5665445A - Electron beam applying device - Google Patents

Electron beam applying device

Info

Publication number
JPS5665445A
JPS5665445A JP13977079A JP13977079A JPS5665445A JP S5665445 A JPS5665445 A JP S5665445A JP 13977079 A JP13977079 A JP 13977079A JP 13977079 A JP13977079 A JP 13977079A JP S5665445 A JPS5665445 A JP S5665445A
Authority
JP
Japan
Prior art keywords
electron beam
throttle
board
depth
beam passing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13977079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS624818B2 (cg-RX-API-DMAC7.html
Inventor
Koichi Hara
Minoru Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13977079A priority Critical patent/JPS5665445A/ja
Publication of JPS5665445A publication Critical patent/JPS5665445A/ja
Publication of JPS624818B2 publication Critical patent/JPS624818B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP13977079A 1979-10-31 1979-10-31 Electron beam applying device Granted JPS5665445A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13977079A JPS5665445A (en) 1979-10-31 1979-10-31 Electron beam applying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13977079A JPS5665445A (en) 1979-10-31 1979-10-31 Electron beam applying device

Publications (2)

Publication Number Publication Date
JPS5665445A true JPS5665445A (en) 1981-06-03
JPS624818B2 JPS624818B2 (cg-RX-API-DMAC7.html) 1987-02-02

Family

ID=15252989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13977079A Granted JPS5665445A (en) 1979-10-31 1979-10-31 Electron beam applying device

Country Status (1)

Country Link
JP (1) JPS5665445A (cg-RX-API-DMAC7.html)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS455382Y1 (cg-RX-API-DMAC7.html) * 1966-04-06 1970-03-14
JPS5258354A (en) * 1975-11-07 1977-05-13 Hitachi Ltd Electronic beam iris unit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS455382Y1 (cg-RX-API-DMAC7.html) * 1966-04-06 1970-03-14
JPS5258354A (en) * 1975-11-07 1977-05-13 Hitachi Ltd Electronic beam iris unit

Also Published As

Publication number Publication date
JPS624818B2 (cg-RX-API-DMAC7.html) 1987-02-02

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