JPS5662325A - Electronic beam exposure device - Google Patents

Electronic beam exposure device

Info

Publication number
JPS5662325A
JPS5662325A JP13893279A JP13893279A JPS5662325A JP S5662325 A JPS5662325 A JP S5662325A JP 13893279 A JP13893279 A JP 13893279A JP 13893279 A JP13893279 A JP 13893279A JP S5662325 A JPS5662325 A JP S5662325A
Authority
JP
Japan
Prior art keywords
exposure
waiting time
electronic beam
distances
commencement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13893279A
Other languages
Japanese (ja)
Inventor
Yoshiaki Goto
Seigo Igaki
Yasuo Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13893279A priority Critical patent/JPS5662325A/en
Publication of JPS5662325A publication Critical patent/JPS5662325A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To set an exposure waiting time to the optimum value relative to deflection distance, by determining by calculation whichever larger one of distances in directions X and Y between exposure regions, and also by making selective output of picturing commencement waiting time in accordance with thus calculated output. CONSTITUTION:When exposure of electronic beam to an exposure region ended, exposure data are transferred from a memory 2 to a resistor 5 at DMA mode by control of a processor 1. These exposure data are composed of scanning commencement X-Y coordinate scanning end X-Y coordinate of the exposure region, and by this, a deflection control unit 6 deflects electronic beam and draws a pattern on a substrate 10. By determining large and small between distances DELTAX and DELTAY, the waiting time is set in relation to the larger distance.
JP13893279A 1979-10-27 1979-10-27 Electronic beam exposure device Pending JPS5662325A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13893279A JPS5662325A (en) 1979-10-27 1979-10-27 Electronic beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13893279A JPS5662325A (en) 1979-10-27 1979-10-27 Electronic beam exposure device

Publications (1)

Publication Number Publication Date
JPS5662325A true JPS5662325A (en) 1981-05-28

Family

ID=15233506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13893279A Pending JPS5662325A (en) 1979-10-27 1979-10-27 Electronic beam exposure device

Country Status (1)

Country Link
JP (1) JPS5662325A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60236224A (en) * 1984-05-09 1985-11-25 Jeol Ltd Charged particle beam lithography
JPS63133525A (en) * 1986-11-26 1988-06-06 Toshiba Corp Charged beam aligner

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103683A (en) * 1976-02-27 1977-08-31 Nippon Seiko Kk Switch which is operated by tension of seat belt

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103683A (en) * 1976-02-27 1977-08-31 Nippon Seiko Kk Switch which is operated by tension of seat belt

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60236224A (en) * 1984-05-09 1985-11-25 Jeol Ltd Charged particle beam lithography
JPS63133525A (en) * 1986-11-26 1988-06-06 Toshiba Corp Charged beam aligner

Similar Documents

Publication Publication Date Title
SE8501905D0 (en) CHARACTER GENERATION SET AND DEVICE
ES8501903A1 (en) Improvements in or relating to X-Y position measuring devices.
JPS5662325A (en) Electronic beam exposure device
JPS5748166A (en) Character segment device
JPS5561844A (en) Graphic display unit of raster scan type
JPS5644977A (en) Pattern information input system
JPS5366756A (en) Measuring method and apparatus of three-dimentional curved surface
JPS5684066A (en) Facsimile read and editing system
JPS564883A (en) Control unit for real coordinate display
JPS5534793A (en) Follow-up steering signal generating device
JPS5683939A (en) Pattern testing process
JPS6476373A (en) Graphic display device
JPS57153444A (en) Determining processing system for route
JPS5449034A (en) Eraser for unneeded part of pattern
JPS5437540A (en) Pre-processing system of scanning-type character pattern recognition device
JPS57146344A (en) Digital operating device
JPS6432393A (en) Rendering processor
JPS57187761A (en) Pattern extraction method
JPS57198641A (en) Pattern detection
JPS522381A (en) Electronics beam deflection scanning method
JPS5635279A (en) Deciding system for reading subject line
JPS54145565A (en) Position detecting method
JPS53137672A (en) Arrangement graph drawing circuit
JPS6474722A (en) Electron beam lithography
JPS5552139A (en) Hatching circuit