JPS5660019A - Mask for exposure to x-ray - Google Patents

Mask for exposure to x-ray

Info

Publication number
JPS5660019A
JPS5660019A JP13627079A JP13627079A JPS5660019A JP S5660019 A JPS5660019 A JP S5660019A JP 13627079 A JP13627079 A JP 13627079A JP 13627079 A JP13627079 A JP 13627079A JP S5660019 A JPS5660019 A JP S5660019A
Authority
JP
Japan
Prior art keywords
rays
opaque
exposure
mask
base plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13627079A
Other languages
Japanese (ja)
Inventor
Tetsunori Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP13627079A priority Critical patent/JPS5660019A/en
Publication of JPS5660019A publication Critical patent/JPS5660019A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Abstract

PURPOSE:To facilitate the discrimination of applying sequence of masks to be used for the exposure to X-rays by a method wherein a pattern for circuit formation consisting of a thin film being opaque to the X-rays to be applies and a discriminating mark being opaque to the visible rays and being transparent to the X-rays are formed on a mask base plate. CONSTITUTION:A plastic film is pasted to a support ring constituting of glass or metal to form a mask base plate 1. A pattern 2 for circuit formation consisting of Au thin film of about 0.5mum thickness being opaque to the X-rays to be used, is formed on the base plate using the electron beam exposure technigue, etc. Moreover a discriminating mark 3 consisting of Al thin film of about 300Angstrom thickness being opaque to the visible rays and being transparent to the X-rays to be used, is formed in piles using the vacuum deposition technique. By this way, the applying sequence of the mask for exposure can be easily discriminated.
JP13627079A 1979-10-22 1979-10-22 Mask for exposure to x-ray Pending JPS5660019A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13627079A JPS5660019A (en) 1979-10-22 1979-10-22 Mask for exposure to x-ray

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13627079A JPS5660019A (en) 1979-10-22 1979-10-22 Mask for exposure to x-ray

Publications (1)

Publication Number Publication Date
JPS5660019A true JPS5660019A (en) 1981-05-23

Family

ID=15171258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13627079A Pending JPS5660019A (en) 1979-10-22 1979-10-22 Mask for exposure to x-ray

Country Status (1)

Country Link
JP (1) JPS5660019A (en)

Similar Documents

Publication Publication Date Title
GB1499294A (en) Manufacture of masks
JPS5593225A (en) Forming method of minute pattern
JPS5340281A (en) Photo mask material and manufacturtof it
GB1276076A (en) Etching film materials
GB1489775A (en) Method of producing a replicating matrix
JPS5764739A (en) Photomask substrate and photomask
JPS5570935A (en) Manufacture for magnetic recording media
JPS5660019A (en) Mask for exposure to x-ray
JPS5532088A (en) Photo mask forming method
EP0057268A3 (en) Method of fabricating x-ray lithographic masks
JPS57160127A (en) Manufacture of transcribe mask for x-ray exposure
JPS5742043A (en) Photosensitive material
JPS5437579A (en) Chrome plate
JPS5461478A (en) Chromium plate
JPS53147465A (en) Forming method of patterns for lift-off
JPS53135844A (en) Photochemical etching procee
GB1485097A (en) Coatings on a transparent substrate
JPS5635137A (en) Photomask
JPS5586118A (en) Alignment mark formation
JPS5748731A (en) Manufacture of mask
JPS5568634A (en) Manufacture of mask for x-ray exposure
JPS5741637A (en) Microstep tablet
JPS56130751A (en) Manufacture of mask
JPS5496371A (en) Mask forming method
JPS5619054A (en) Metal photomask