JPS5654622B2 - - Google Patents

Info

Publication number
JPS5654622B2
JPS5654622B2 JP16230278A JP16230278A JPS5654622B2 JP S5654622 B2 JPS5654622 B2 JP S5654622B2 JP 16230278 A JP16230278 A JP 16230278A JP 16230278 A JP16230278 A JP 16230278A JP S5654622 B2 JPS5654622 B2 JP S5654622B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16230278A
Other versions
JPS5590942A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16230278A priority Critical patent/JPS5590942A/ja
Publication of JPS5590942A publication Critical patent/JPS5590942A/ja
Publication of JPS5654622B2 publication Critical patent/JPS5654622B2/ja
Granted legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
JP16230278A 1978-12-29 1978-12-29 Positive type resist material Granted JPS5590942A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16230278A JPS5590942A (en) 1978-12-29 1978-12-29 Positive type resist material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16230278A JPS5590942A (en) 1978-12-29 1978-12-29 Positive type resist material

Publications (2)

Publication Number Publication Date
JPS5590942A JPS5590942A (en) 1980-07-10
JPS5654622B2 true JPS5654622B2 (ja) 1981-12-26

Family

ID=15751909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16230278A Granted JPS5590942A (en) 1978-12-29 1978-12-29 Positive type resist material

Country Status (1)

Country Link
JP (1) JPS5590942A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH087444B2 (ja) * 1989-01-26 1996-01-29 東レ株式会社 感放射線ポジ型レジスト

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (ja) * 1972-12-21 1974-10-01 Philips Nv
JPS51117577A (en) * 1975-03-20 1976-10-15 Philips Nv Positive operation type electron resist
JPS5344441A (en) * 1976-10-04 1978-04-21 Ibm Material for resist
JPS5376826A (en) * 1976-12-20 1978-07-07 Ibm Method of forming regist image

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (ja) * 1972-12-21 1974-10-01 Philips Nv
JPS51117577A (en) * 1975-03-20 1976-10-15 Philips Nv Positive operation type electron resist
JPS5344441A (en) * 1976-10-04 1978-04-21 Ibm Material for resist
JPS5376826A (en) * 1976-12-20 1978-07-07 Ibm Method of forming regist image

Also Published As

Publication number Publication date
JPS5590942A (en) 1980-07-10

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