JPS5654620B2 - - Google Patents
Info
- Publication number
- JPS5654620B2 JPS5654620B2 JP15203176A JP15203176A JPS5654620B2 JP S5654620 B2 JPS5654620 B2 JP S5654620B2 JP 15203176 A JP15203176 A JP 15203176A JP 15203176 A JP15203176 A JP 15203176A JP S5654620 B2 JPS5654620 B2 JP S5654620B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15203176A JPS5376825A (en) | 1976-12-20 | 1976-12-20 | Radiation sensitive positive regist material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15203176A JPS5376825A (en) | 1976-12-20 | 1976-12-20 | Radiation sensitive positive regist material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5376825A JPS5376825A (en) | 1978-07-07 |
| JPS5654620B2 true JPS5654620B2 (show.php) | 1981-12-26 |
Family
ID=15531537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15203176A Granted JPS5376825A (en) | 1976-12-20 | 1976-12-20 | Radiation sensitive positive regist material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5376825A (show.php) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1602724A (en) * | 1977-04-26 | 1981-11-18 | Standard Telephones Cables Ltd | Resist material for x-ray lithography |
| JPS5511217A (en) * | 1978-07-10 | 1980-01-26 | Nippon Telegr & Teleph Corp <Ntt> | Pattern forming method using radiation sensitive high polymer |
| JPS5639536A (en) * | 1979-09-07 | 1981-04-15 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Ionizing radiation sensitive resist |
| JPS5639537A (en) * | 1979-09-07 | 1981-04-15 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Ionized radiation sensitive resist |
| JPS5860536A (ja) * | 1981-10-06 | 1983-04-11 | Toshiba Corp | レジスト像形成方法 |
| JP2618978B2 (ja) * | 1988-05-26 | 1997-06-11 | 富士通株式会社 | レジスト材料およびこのレジスト材料を使用するパターン形成方法 |
| CN108368321B (zh) | 2015-12-11 | 2020-12-15 | 富士胶片株式会社 | 光学功能性层制作用组合物、光学膜及液晶显示装置 |
| KR102906438B1 (ko) * | 2019-02-22 | 2025-12-30 | 도요 고세이 고교 가부시키가이샤 | 폴리머, 해당 폴리머를 함유하는 레지스트 조성물, 그것을 이용한 부재의 제조 방법, 패턴 형성 방법 및 반전 패턴의 형성 방법 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4011351A (en) * | 1975-01-29 | 1977-03-08 | International Business Machines Corporation | Preparation of resist image with methacrylate polymers |
| JPS5344441U (show.php) * | 1976-09-20 | 1978-04-15 |
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1976
- 1976-12-20 JP JP15203176A patent/JPS5376825A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5376825A (en) | 1978-07-07 |