JPS564244A - Continuous vacuum treatment device for wafer - Google Patents

Continuous vacuum treatment device for wafer

Info

Publication number
JPS564244A
JPS564244A JP7920079A JP7920079A JPS564244A JP S564244 A JPS564244 A JP S564244A JP 7920079 A JP7920079 A JP 7920079A JP 7920079 A JP7920079 A JP 7920079A JP S564244 A JPS564244 A JP S564244A
Authority
JP
Japan
Prior art keywords
wafer
rest
chamber
treatment
pins
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7920079A
Other languages
English (en)
Other versions
JPS6339102B2 (ja
Inventor
Atsushi Fujisawa
Hiroshi Maejima
Seiichi Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7920079A priority Critical patent/JPS564244A/ja
Publication of JPS564244A publication Critical patent/JPS564244A/ja
Publication of JPS6339102B2 publication Critical patent/JPS6339102B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Vacuum Packaging (AREA)
JP7920079A 1979-06-25 1979-06-25 Continuous vacuum treatment device for wafer Granted JPS564244A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7920079A JPS564244A (en) 1979-06-25 1979-06-25 Continuous vacuum treatment device for wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7920079A JPS564244A (en) 1979-06-25 1979-06-25 Continuous vacuum treatment device for wafer

Publications (2)

Publication Number Publication Date
JPS564244A true JPS564244A (en) 1981-01-17
JPS6339102B2 JPS6339102B2 (ja) 1988-08-03

Family

ID=13683312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7920079A Granted JPS564244A (en) 1979-06-25 1979-06-25 Continuous vacuum treatment device for wafer

Country Status (1)

Country Link
JP (1) JPS564244A (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57134946A (en) * 1981-02-16 1982-08-20 Toshiba Corp Carrying device for semiconductor substrate
JPS58118124A (ja) * 1982-01-06 1983-07-14 Hitachi Ltd ウエ−ハロ−デイング法
JPS58155764U (ja) * 1982-04-14 1983-10-18 鈴木　了 バツテリ−液の自動補充装置
JPS59116372A (ja) * 1982-12-23 1984-07-05 Hitachi Ltd 連続真空処理装置
US4483651A (en) * 1980-08-14 1984-11-20 Tokyo Ohka Kogyo Kabushiki Kaisha Automatic apparatus for continuous treatment of leaf materials with gas plasma
JPS6267832A (ja) * 1985-09-20 1987-03-27 Hitachi Ltd 基板搬送方法
US4724874A (en) * 1986-05-01 1988-02-16 Asyst Technologies Sealable transportable container having a particle filtering system
US5037262A (en) * 1988-07-15 1991-08-06 Balzers Aktiengesellschaft Holding device for a disk and application therefor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04163302A (ja) * 1990-10-18 1992-06-08 Wacoal Corp 人体にフィットする下着

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023769A (ja) * 1973-06-12 1975-03-14
JPS5039070A (ja) * 1973-06-29 1975-04-10

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023769A (ja) * 1973-06-12 1975-03-14
JPS5039070A (ja) * 1973-06-29 1975-04-10

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4483651A (en) * 1980-08-14 1984-11-20 Tokyo Ohka Kogyo Kabushiki Kaisha Automatic apparatus for continuous treatment of leaf materials with gas plasma
JPS57134946A (en) * 1981-02-16 1982-08-20 Toshiba Corp Carrying device for semiconductor substrate
JPS58118124A (ja) * 1982-01-06 1983-07-14 Hitachi Ltd ウエ−ハロ−デイング法
JPS58155764U (ja) * 1982-04-14 1983-10-18 鈴木　了 バツテリ−液の自動補充装置
JPS59116372A (ja) * 1982-12-23 1984-07-05 Hitachi Ltd 連続真空処理装置
JPH0377274B2 (ja) * 1982-12-23 1991-12-10 Hitachi Ltd
JPS6267832A (ja) * 1985-09-20 1987-03-27 Hitachi Ltd 基板搬送方法
US4724874A (en) * 1986-05-01 1988-02-16 Asyst Technologies Sealable transportable container having a particle filtering system
US5037262A (en) * 1988-07-15 1991-08-06 Balzers Aktiengesellschaft Holding device for a disk and application therefor

Also Published As

Publication number Publication date
JPS6339102B2 (ja) 1988-08-03

Similar Documents

Publication Publication Date Title
ATE87561T1 (de) Vorrichtung zum handhaben von scheibenfoermigen lebensmitteln.
JPS564244A (en) Continuous vacuum treatment device for wafer
EP0034377A3 (en) Method and apparatus for feeding articles, especially packages, into the run of an endless conveyor
GB1307900A (en) Packing machine
GB1527027A (en) Article conveying and orienting apparatus
ES8307641A1 (es) Metodo y aparato para la manipulacion de montones de productos alimenticios en rebanadas para permitir la introduccion de los montones en cavidades de recipientes.
GB1483524A (en) Conveyor unloader
GB1328420A (en) Belt conveyor unloading device
GB1359432A (en) Article transferring apparatus
GB1036929A (en) Improvements in or relating to packaging apparatus
GB1514817A (en) Process and apparatus for copying on printing plates
GB1522202A (en) Conveyor apparatus
GB1522201A (en) Conveyor systems
ES363210A1 (es) Un transportador para proporcionar una superficie en movi- miento continuo para transportar carga.
GB1422644A (en) Article handling apparatus
GB2018705A (en) Article handling apparatus
EP0044383A3 (en) Device for folding linen
US3878932A (en) Container arrester for hydrostatic cooker
GB1440348A (en) Device for advancing lifting and shifting prismatic boxes to a wrapping material
GB1532422A (en) Apparatus for handling rod-like articles
GB1358497A (en) Apparatus for processing pieces of dough
AU498624B2 (en) Apparatus for manufacturing conveyor belts
JPS5488553A (en) Method of and device for sorting row of articles
GB1099019A (en) Wafer feed device
JPS5785723A (en) Device for automatically truing up and conveying articles