JPS5640492B2 - - Google Patents
Info
- Publication number
- JPS5640492B2 JPS5640492B2 JP12388575A JP12388575A JPS5640492B2 JP S5640492 B2 JPS5640492 B2 JP S5640492B2 JP 12388575 A JP12388575 A JP 12388575A JP 12388575 A JP12388575 A JP 12388575A JP S5640492 B2 JPS5640492 B2 JP S5640492B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/91—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics involving the removal of part of the materials of the treated articles, e.g. etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
- H01L21/02244—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of a metallic layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7435152A FR2288138A1 (en) | 1974-10-18 | 1974-10-18 | Removal of aluminium oxide layer by etching - using a solution of fluoride in an organic solvent |
FR7435151A FR2288392A1 (en) | 1974-10-18 | 1974-10-18 | PROCESS FOR THE EMBODIMENT OF SEMICONDUCTOR DEVICES |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5169369A JPS5169369A (en) | 1976-06-15 |
JPS5640492B2 true JPS5640492B2 (en) | 1981-09-21 |
Family
ID=26218562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12388575A Expired JPS5640492B2 (en) | 1974-10-18 | 1975-10-16 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5640492B2 (en) |
BR (1) | BR7506737A (en) |
DE (1) | DE2546316C2 (en) |
GB (1) | GB1526425A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3048083C2 (en) * | 1980-12-19 | 1983-09-29 | Ludwig 8900 Augsburg Fahrmbacher-Lutz | Process for the chemical removal of oxide layers from objects made of titanium or titanium alloys |
JPS59184532A (en) * | 1983-04-05 | 1984-10-19 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
WO1999046811A1 (en) * | 1998-03-10 | 1999-09-16 | Scacco Electronics Consulting | Selective etching of silicon nitride by means of a wet chemical process |
US11306249B2 (en) | 2018-01-30 | 2022-04-19 | Tokyo Electron Limited | Substrate processing method, substrate processing device and etching liquid |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4941716A (en) * | 1972-08-25 | 1974-04-19 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2828193A (en) * | 1954-08-09 | 1958-03-25 | Turco Products Inc | Method for rejuvenation of aluminum treating solutions |
-
1975
- 1975-10-15 GB GB42222/75A patent/GB1526425A/en not_active Expired
- 1975-10-15 BR BR7506737*A patent/BR7506737A/en unknown
- 1975-10-16 JP JP12388575A patent/JPS5640492B2/ja not_active Expired
- 1975-10-16 DE DE2546316A patent/DE2546316C2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4941716A (en) * | 1972-08-25 | 1974-04-19 |
Also Published As
Publication number | Publication date |
---|---|
BR7506737A (en) | 1976-08-17 |
DE2546316C2 (en) | 1982-11-11 |
JPS5169369A (en) | 1976-06-15 |
GB1526425A (en) | 1978-09-27 |
DE2546316A1 (en) | 1976-04-22 |