JPS5640329B2 - - Google Patents
Info
- Publication number
- JPS5640329B2 JPS5640329B2 JP4037772A JP4037772A JPS5640329B2 JP S5640329 B2 JPS5640329 B2 JP S5640329B2 JP 4037772 A JP4037772 A JP 4037772A JP 4037772 A JP4037772 A JP 4037772A JP S5640329 B2 JPS5640329 B2 JP S5640329B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4037772A JPS5640329B2 (ko) | 1972-04-24 | 1972-04-24 | |
US05/575,426 US3980483A (en) | 1972-04-24 | 1975-05-07 | Photocurable composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4037772A JPS5640329B2 (ko) | 1972-04-24 | 1972-04-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS492601A JPS492601A (ko) | 1974-01-10 |
JPS5640329B2 true JPS5640329B2 (ko) | 1981-09-19 |
Family
ID=12578941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4037772A Expired JPS5640329B2 (ko) | 1972-04-24 | 1972-04-24 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5640329B2 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7030170B2 (en) | 2001-11-22 | 2006-04-18 | Mitsui Chemicals, Inc. | Photosensitive resin composition, dry film, and workpiece using the same |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5514087B2 (ko) * | 1973-09-05 | 1980-04-14 | ||
JPS5813611A (ja) * | 1981-07-16 | 1983-01-26 | Dainichi Nippon Cables Ltd | ポリオレフインの架橋方法 |
FR2514159A1 (fr) * | 1981-10-02 | 1983-04-08 | Rhone Poulenc Syst | Composition photosensible et plaque lithographique realisee a l'aide de cette composition |
JPS61246265A (ja) * | 1985-04-25 | 1986-11-01 | Toyo Ink Mfg Co Ltd | 活性エネルギ−線硬化性被覆組成物 |
JPS63258975A (ja) * | 1986-12-26 | 1988-10-26 | Toshiba Corp | ソルダーレジストインキ組成物 |
JPH083633B2 (ja) * | 1987-05-08 | 1996-01-17 | タムラ化研株式会社 | 耐熱性皮膜形成用感光性組成物 |
JPH0823694B2 (ja) * | 1988-08-04 | 1996-03-06 | 富士写真フイルム株式会社 | 液状感光性樹脂組成物 |
JPH03126950A (ja) * | 1989-10-12 | 1991-05-30 | Fuji Photo Film Co Ltd | 光硬化性樹脂組成物 |
WO1996028764A1 (fr) * | 1993-09-02 | 1996-09-19 | Goo Chemical Industries Co., Ltd. | Composition de resine photosensible et couche mince de revetement, encre resist, resist de soudure et plaquette a circuits imprimes realises avec cette composition |
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1972
- 1972-04-24 JP JP4037772A patent/JPS5640329B2/ja not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7030170B2 (en) | 2001-11-22 | 2006-04-18 | Mitsui Chemicals, Inc. | Photosensitive resin composition, dry film, and workpiece using the same |
Also Published As
Publication number | Publication date |
---|---|
JPS492601A (ko) | 1974-01-10 |