JPS5638472A - Formation of silica coating - Google Patents
Formation of silica coatingInfo
- Publication number
- JPS5638472A JPS5638472A JP11439779A JP11439779A JPS5638472A JP S5638472 A JPS5638472 A JP S5638472A JP 11439779 A JP11439779 A JP 11439779A JP 11439779 A JP11439779 A JP 11439779A JP S5638472 A JPS5638472 A JP S5638472A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- acid
- catalyst
- alkoxysilane
- org
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 title abstract 5
- 238000000576 coating method Methods 0.000 title abstract 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 4
- 239000000377 silicon dioxide Substances 0.000 title abstract 2
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000003054 catalyst Substances 0.000 abstract 4
- 239000002904 solvent Substances 0.000 abstract 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 2
- 239000003377 acid catalyst Substances 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 abstract 1
- 229910002651 NO3 Inorganic materials 0.000 abstract 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 abstract 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 150000001298 alcohols Chemical class 0.000 abstract 1
- 150000008064 anhydrides Chemical class 0.000 abstract 1
- 238000001354 calcination Methods 0.000 abstract 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 abstract 1
- 239000003729 cation exchange resin Substances 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 150000002170 ethers Chemical class 0.000 abstract 1
- 150000004820 halides Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910017604 nitric acid Inorganic materials 0.000 abstract 1
- 230000000737 periodic effect Effects 0.000 abstract 1
- 239000011148 porous material Substances 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 150000005846 sugar alcohols Polymers 0.000 abstract 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Catalysts (AREA)
- Chemically Coating (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11439779A JPS5638472A (en) | 1979-09-06 | 1979-09-06 | Formation of silica coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11439779A JPS5638472A (en) | 1979-09-06 | 1979-09-06 | Formation of silica coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5638472A true JPS5638472A (en) | 1981-04-13 |
| JPS6343468B2 JPS6343468B2 (enrdf_load_stackoverflow) | 1988-08-30 |
Family
ID=14636648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11439779A Granted JPS5638472A (en) | 1979-09-06 | 1979-09-06 | Formation of silica coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5638472A (enrdf_load_stackoverflow) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5794057A (en) * | 1980-12-02 | 1982-06-11 | Chisso Corp | Preparation of coating solution for forming silica coat |
| JPS58105694A (ja) * | 1981-12-17 | 1983-06-23 | Onkyo Corp | 音響変換器用振動板 |
| JPS58189263A (ja) * | 1982-04-28 | 1983-11-04 | Hitachi Chem Co Ltd | ＳｉＯ↓２膜形成用塗布液 |
| JPS5927961A (ja) * | 1982-08-10 | 1984-02-14 | Alps Electric Co Ltd | 透明被膜形成用ペ−ストおよび透明被膜 |
| JPS5927963A (ja) * | 1982-08-10 | 1984-02-14 | Alps Electric Co Ltd | 透明被膜形成用ペ−ストおよび透明被膜 |
| JPH021778A (ja) * | 1988-02-02 | 1990-01-08 | Hitachi Chem Co Ltd | 半導体の表面保護又は層間絶縁用酸化物被膜形成用塗布液および酸化物被膜の製造法 |
| JPH06227512A (ja) * | 1993-01-27 | 1994-08-16 | Sumitomo Electric Ind Ltd | コアレスコイルの包装方法 |
| US6099911A (en) * | 1996-10-04 | 2000-08-08 | Showa Denko K.K. | Process for forming silica film |
| KR100514600B1 (ko) * | 2004-02-19 | 2005-09-14 | 구상만 | 표면 개질된 중공 입자의 제조 방법 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3789023A (en) * | 1972-08-09 | 1974-01-29 | Motorola Inc | Liquid diffusion dopant source for semiconductors |
| JPS5317389A (en) * | 1976-07-30 | 1978-02-17 | Ajinomoto Kk | Analysis of vegetable protein in animal protein products |
| JPS5424831A (en) * | 1977-07-26 | 1979-02-24 | Hitachi Chem Co Ltd | Preparation of silanol oligomer liquid |
| US4154617A (en) * | 1976-11-29 | 1979-05-15 | Grow Chemical Corp. | Silicon coating compositions and method of production |
| JPS5626750A (en) * | 1979-08-13 | 1981-03-14 | Tokyo Ohka Kogyo Co Ltd | Bleeding preventing method for contained component from solid surface |
-
1979
- 1979-09-06 JP JP11439779A patent/JPS5638472A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3789023A (en) * | 1972-08-09 | 1974-01-29 | Motorola Inc | Liquid diffusion dopant source for semiconductors |
| JPS5317389A (en) * | 1976-07-30 | 1978-02-17 | Ajinomoto Kk | Analysis of vegetable protein in animal protein products |
| US4154617A (en) * | 1976-11-29 | 1979-05-15 | Grow Chemical Corp. | Silicon coating compositions and method of production |
| JPS5424831A (en) * | 1977-07-26 | 1979-02-24 | Hitachi Chem Co Ltd | Preparation of silanol oligomer liquid |
| JPS5626750A (en) * | 1979-08-13 | 1981-03-14 | Tokyo Ohka Kogyo Co Ltd | Bleeding preventing method for contained component from solid surface |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5794057A (en) * | 1980-12-02 | 1982-06-11 | Chisso Corp | Preparation of coating solution for forming silica coat |
| JPS58105694A (ja) * | 1981-12-17 | 1983-06-23 | Onkyo Corp | 音響変換器用振動板 |
| JPS58189263A (ja) * | 1982-04-28 | 1983-11-04 | Hitachi Chem Co Ltd | ＳｉＯ↓２膜形成用塗布液 |
| JPS5927961A (ja) * | 1982-08-10 | 1984-02-14 | Alps Electric Co Ltd | 透明被膜形成用ペ−ストおよび透明被膜 |
| JPS5927963A (ja) * | 1982-08-10 | 1984-02-14 | Alps Electric Co Ltd | 透明被膜形成用ペ−ストおよび透明被膜 |
| JPH021778A (ja) * | 1988-02-02 | 1990-01-08 | Hitachi Chem Co Ltd | 半導体の表面保護又は層間絶縁用酸化物被膜形成用塗布液および酸化物被膜の製造法 |
| JPH06227512A (ja) * | 1993-01-27 | 1994-08-16 | Sumitomo Electric Ind Ltd | コアレスコイルの包装方法 |
| US6099911A (en) * | 1996-10-04 | 2000-08-08 | Showa Denko K.K. | Process for forming silica film |
| KR100514600B1 (ko) * | 2004-02-19 | 2005-09-14 | 구상만 | 표면 개질된 중공 입자의 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6343468B2 (enrdf_load_stackoverflow) | 1988-08-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040514 |
|
| A621 | Written request for application examination |
Effective date: 20040514 Free format text: JAPANESE INTERMEDIATE CODE: A621 |
|
| A521 | Written amendment |
Effective date: 20040803 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
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| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20051206 |
|
| A601 | Written request for extension of time |
Effective date: 20060303 Free format text: JAPANESE INTERMEDIATE CODE: A601 |
|
| A602 | Written permission of extension of time |
Effective date: 20060424 Free format text: JAPANESE INTERMEDIATE CODE: A602 |
|
| A313 | Final decision of rejection without a dissenting response from the applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A313 Effective date: 20060724 |
|
| A02 | Decision of refusal |
Effective date: 20060829 Free format text: JAPANESE INTERMEDIATE CODE: A02 |