JPS5638054B2 - - Google Patents

Info

Publication number
JPS5638054B2
JPS5638054B2 JP7581774A JP7581774A JPS5638054B2 JP S5638054 B2 JPS5638054 B2 JP S5638054B2 JP 7581774 A JP7581774 A JP 7581774A JP 7581774 A JP7581774 A JP 7581774A JP S5638054 B2 JPS5638054 B2 JP S5638054B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7581774A
Other languages
Japanese (ja)
Other versions
JPS515956A (US08197722-20120612-C00042.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7581774A priority Critical patent/JPS5638054B2/ja
Priority to GB26997/75A priority patent/GB1497457A/en
Priority to US05/590,554 priority patent/US4030949A/en
Priority to DE752529747A priority patent/DE2529747C3/de
Priority to FR7520950A priority patent/FR2277432A1/fr
Priority to NLAANVRAGE7507908,A priority patent/NL172876C/xx
Priority to CA230,768A priority patent/CA1041646A/en
Publication of JPS515956A publication Critical patent/JPS515956A/ja
Publication of JPS5638054B2 publication Critical patent/JPS5638054B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0062Processes for devices with an active region comprising only III-V compounds
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • C30B19/02Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux
    • C30B19/04Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux the solvent being a component of the crystal composition
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02387Group 13/15 materials
    • H01L21/02395Arsenides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02455Group 13/15 materials
    • H01L21/02463Arsenides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02538Group 13/15 materials
    • H01L21/02546Arsenides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/02623Liquid deposition
    • H01L21/02625Liquid deposition using melted materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/084Ion implantation of compound devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Led Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP7581774A 1974-07-04 1974-07-04 Expired JPS5638054B2 (US08197722-20120612-C00042.png)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP7581774A JPS5638054B2 (US08197722-20120612-C00042.png) 1974-07-04 1974-07-04
GB26997/75A GB1497457A (en) 1974-07-04 1975-06-25 Semiconductor-liquid phase epitaxial growth method and semiconductor device manufactured using the same
US05/590,554 US4030949A (en) 1974-07-04 1975-06-26 Method of effecting liquid phase epitaxial growth of group III-V semiconductors
DE752529747A DE2529747C3 (de) 1974-07-04 1975-07-03 Verfahren zur Erzeugung von epitaktischen Aufwachsungen aus der flussigen Phase
FR7520950A FR2277432A1 (fr) 1974-07-04 1975-07-03 Procede de croissance epitaxiale en phase liquide des semiconducteurs et dispositif a semiconducteur ainsi realise
NLAANVRAGE7507908,A NL172876C (nl) 1974-07-04 1975-07-03 Werkwijze voor het epitaxiaal vanuit de vloeibare fase laten groeien van gaas of alxgaŸ1-xas op een substraat.
CA230,768A CA1041646A (en) 1974-07-04 1975-07-04 Semiconductor-liquid phase epitaxial growth method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7581774A JPS5638054B2 (US08197722-20120612-C00042.png) 1974-07-04 1974-07-04

Publications (2)

Publication Number Publication Date
JPS515956A JPS515956A (US08197722-20120612-C00042.png) 1976-01-19
JPS5638054B2 true JPS5638054B2 (US08197722-20120612-C00042.png) 1981-09-03

Family

ID=13587101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7581774A Expired JPS5638054B2 (US08197722-20120612-C00042.png) 1974-07-04 1974-07-04

Country Status (7)

Country Link
US (1) US4030949A (US08197722-20120612-C00042.png)
JP (1) JPS5638054B2 (US08197722-20120612-C00042.png)
CA (1) CA1041646A (US08197722-20120612-C00042.png)
DE (1) DE2529747C3 (US08197722-20120612-C00042.png)
FR (1) FR2277432A1 (US08197722-20120612-C00042.png)
GB (1) GB1497457A (US08197722-20120612-C00042.png)
NL (1) NL172876C (US08197722-20120612-C00042.png)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5567130A (en) * 1978-11-14 1980-05-21 Mitsubishi Electric Corp Method of manufacturing semiconductor crystal
US4315832A (en) * 1979-03-05 1982-02-16 Hughes Aircraft Company Process for increasing laser crystal fluorescence yield by controlled atmosphere processing
JPS5623740A (en) * 1979-08-06 1981-03-06 Fujitsu Ltd Multilayer liquid phase epitaxial growing method
JPS582294A (ja) * 1981-06-29 1983-01-07 Fujitsu Ltd 気相成長方法
US5185288A (en) * 1988-08-26 1993-02-09 Hewlett-Packard Company Epitaxial growth method
JP2507888B2 (ja) * 1988-11-19 1996-06-19 工業技術院長 ヘテロ構造体の製造方法
US4981332A (en) * 1989-06-29 1991-01-01 Hughes Aircraft Company Dispersion-compensated windshield hologram virtual image display
US5338389A (en) * 1990-01-19 1994-08-16 Research Development Corporation Of Japan Method of epitaxially growing compound crystal and doping method therein
JPH08225968A (ja) * 1995-02-01 1996-09-03 Hewlett Packard Co <Hp> 多成分系固体材料のエッチング方法
US6228166B1 (en) * 1996-11-20 2001-05-08 Nec Corporation Method for boron contamination reduction in IC fabrication
JP4784904B2 (ja) * 2001-08-29 2011-10-05 信越半導体株式会社 液相成長装置及びそれを使用する液相成長方法
RU2639263C1 (ru) * 2016-09-15 2017-12-20 Общество с ограниченной ответственностью "Ме Га Эпитех" Способ получения многослойных гетероэпитаксиальных структур в системе AlGaAs методом жидкофазной эпитаксии

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4877766A (US08197722-20120612-C00042.png) * 1972-01-19 1973-10-19
JPS4877765A (US08197722-20120612-C00042.png) * 1972-01-18 1973-10-19
JPS4880276A (US08197722-20120612-C00042.png) * 1972-01-28 1973-10-27

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3294600A (en) * 1962-11-26 1966-12-27 Nippon Electric Co Method of manufacture of semiconductor elements
JPS4921991B1 (US08197722-20120612-C00042.png) * 1969-06-27 1974-06-05
FR2086578A5 (US08197722-20120612-C00042.png) * 1970-04-02 1971-12-31 Labo Electronique Physique
GB1273284A (en) * 1970-10-13 1972-05-03 Standard Telephones Cables Ltd Improvements in or relating to injection lasers
US3933538A (en) * 1972-01-18 1976-01-20 Sumitomo Electric Industries, Ltd. Method and apparatus for production of liquid phase epitaxial layers of semiconductors

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4877765A (US08197722-20120612-C00042.png) * 1972-01-18 1973-10-19
JPS4877766A (US08197722-20120612-C00042.png) * 1972-01-19 1973-10-19
JPS4880276A (US08197722-20120612-C00042.png) * 1972-01-28 1973-10-27

Also Published As

Publication number Publication date
FR2277432B1 (US08197722-20120612-C00042.png) 1978-03-17
NL7507908A (nl) 1976-01-06
NL172876B (nl) 1983-06-01
NL172876C (nl) 1983-11-01
CA1041646A (en) 1978-10-31
DE2529747C3 (de) 1979-03-08
DE2529747B2 (de) 1978-07-20
FR2277432A1 (fr) 1976-01-30
GB1497457A (en) 1978-01-12
JPS515956A (US08197722-20120612-C00042.png) 1976-01-19
DE2529747A1 (de) 1976-01-15
US4030949A (en) 1977-06-21

Similar Documents

Publication Publication Date Title
FR2263970A1 (US08197722-20120612-C00042.png)
FR2277432B1 (US08197722-20120612-C00042.png)
JPS5346594B2 (US08197722-20120612-C00042.png)
FR2256880B3 (US08197722-20120612-C00042.png)
JPS50105443U (US08197722-20120612-C00042.png)
JPS50137799U (US08197722-20120612-C00042.png)
CH568564A5 (US08197722-20120612-C00042.png)
BG26544A3 (US08197722-20120612-C00042.png)
CH577702B5 (US08197722-20120612-C00042.png)
CH577399A5 (US08197722-20120612-C00042.png)
CH577283A5 (US08197722-20120612-C00042.png)
CH577150A5 (US08197722-20120612-C00042.png)
CH576925A5 (US08197722-20120612-C00042.png)
CH576645A5 (US08197722-20120612-C00042.png)
CH576020A5 (US08197722-20120612-C00042.png)
CH575116A5 (US08197722-20120612-C00042.png)
CH574074A5 (US08197722-20120612-C00042.png)
CH573545A5 (US08197722-20120612-C00042.png)
CH570727A5 (US08197722-20120612-C00042.png)
CH569931A5 (US08197722-20120612-C00042.png)
CH569303A5 (US08197722-20120612-C00042.png)
CH578204B5 (US08197722-20120612-C00042.png)
CH567925A5 (US08197722-20120612-C00042.png)
CH565470A5 (US08197722-20120612-C00042.png)
CH563212A5 (US08197722-20120612-C00042.png)