JPS5632364A - Manufacture of target ceramic for high frequence sputtering - Google Patents

Manufacture of target ceramic for high frequence sputtering

Info

Publication number
JPS5632364A
JPS5632364A JP10528579A JP10528579A JPS5632364A JP S5632364 A JPS5632364 A JP S5632364A JP 10528579 A JP10528579 A JP 10528579A JP 10528579 A JP10528579 A JP 10528579A JP S5632364 A JPS5632364 A JP S5632364A
Authority
JP
Japan
Prior art keywords
sputtering
manufacture
target ceramic
high frequence
frequence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10528579A
Other languages
Japanese (ja)
Other versions
JPS5851906B2 (en
Inventor
Takuoki Hata
Shinji Shimazaki
Takayuki Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP54105285A priority Critical patent/JPS5851906B2/en
Publication of JPS5632364A publication Critical patent/JPS5632364A/en
Publication of JPS5851906B2 publication Critical patent/JPS5851906B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
JP54105285A 1979-08-17 1979-08-17 Method for manufacturing target porcelain for high frequency sputtering Expired JPS5851906B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54105285A JPS5851906B2 (en) 1979-08-17 1979-08-17 Method for manufacturing target porcelain for high frequency sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54105285A JPS5851906B2 (en) 1979-08-17 1979-08-17 Method for manufacturing target porcelain for high frequency sputtering

Publications (2)

Publication Number Publication Date
JPS5632364A true JPS5632364A (en) 1981-04-01
JPS5851906B2 JPS5851906B2 (en) 1983-11-18

Family

ID=14403397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54105285A Expired JPS5851906B2 (en) 1979-08-17 1979-08-17 Method for manufacturing target porcelain for high frequency sputtering

Country Status (1)

Country Link
JP (1) JPS5851906B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105565798A (en) * 2015-12-18 2016-05-11 广东风华高新科技股份有限公司 Preparation method of zinc oxide target and preparation method of zinc oxide film

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01129044U (en) * 1988-02-24 1989-09-04

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105565798A (en) * 2015-12-18 2016-05-11 广东风华高新科技股份有限公司 Preparation method of zinc oxide target and preparation method of zinc oxide film

Also Published As

Publication number Publication date
JPS5851906B2 (en) 1983-11-18

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