JPS5370047A - Preparation of target material for sputtering - Google Patents

Preparation of target material for sputtering

Info

Publication number
JPS5370047A
JPS5370047A JP14539176A JP14539176A JPS5370047A JP S5370047 A JPS5370047 A JP S5370047A JP 14539176 A JP14539176 A JP 14539176A JP 14539176 A JP14539176 A JP 14539176A JP S5370047 A JPS5370047 A JP S5370047A
Authority
JP
Japan
Prior art keywords
sputtering
preparation
target material
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14539176A
Other languages
Japanese (ja)
Other versions
JPS58511B2 (en
Inventor
Hajime Ichiyanagi
Kengo Ookura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP51145391A priority Critical patent/JPS58511B2/en
Publication of JPS5370047A publication Critical patent/JPS5370047A/en
Publication of JPS58511B2 publication Critical patent/JPS58511B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
JP51145391A 1976-12-02 1976-12-02 Manufacturing method of target material for sputtering Expired JPS58511B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51145391A JPS58511B2 (en) 1976-12-02 1976-12-02 Manufacturing method of target material for sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51145391A JPS58511B2 (en) 1976-12-02 1976-12-02 Manufacturing method of target material for sputtering

Publications (2)

Publication Number Publication Date
JPS5370047A true JPS5370047A (en) 1978-06-22
JPS58511B2 JPS58511B2 (en) 1983-01-06

Family

ID=15384160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51145391A Expired JPS58511B2 (en) 1976-12-02 1976-12-02 Manufacturing method of target material for sputtering

Country Status (1)

Country Link
JP (1) JPS58511B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55154551A (en) * 1979-05-18 1980-12-02 Mitsubishi Metal Corp Manufacture of high chromium alloy material
JPH06280006A (en) * 1993-03-26 1994-10-04 Agency Of Ind Science & Technol Target for producing superconducting thin film, its production, and production of superconducting material using the target

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0311933Y2 (en) * 1984-11-05 1991-03-22
US6248291B1 (en) * 1995-05-18 2001-06-19 Asahi Glass Company Ltd. Process for producing sputtering targets

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4844611A (en) * 1971-10-06 1973-06-27
JPS4995809A (en) * 1972-11-16 1974-09-11
JPS49129606A (en) * 1973-04-17 1974-12-12
JPS5110677A (en) * 1974-07-17 1976-01-28 Nippon Steel Corp Haikibutsushoriro
JPS51100913A (en) * 1975-02-03 1976-09-06 Asea Ab

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4844611A (en) * 1971-10-06 1973-06-27
JPS4995809A (en) * 1972-11-16 1974-09-11
JPS49129606A (en) * 1973-04-17 1974-12-12
JPS5110677A (en) * 1974-07-17 1976-01-28 Nippon Steel Corp Haikibutsushoriro
JPS51100913A (en) * 1975-02-03 1976-09-06 Asea Ab

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55154551A (en) * 1979-05-18 1980-12-02 Mitsubishi Metal Corp Manufacture of high chromium alloy material
JPS6058289B2 (en) * 1979-05-18 1985-12-19 三菱マテリアル株式会社 Manufacturing method of high chromium alloy material
JPH06280006A (en) * 1993-03-26 1994-10-04 Agency Of Ind Science & Technol Target for producing superconducting thin film, its production, and production of superconducting material using the target

Also Published As

Publication number Publication date
JPS58511B2 (en) 1983-01-06

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