JPS5629331A - Water rinsing device - Google Patents

Water rinsing device

Info

Publication number
JPS5629331A
JPS5629331A JP10536979A JP10536979A JPS5629331A JP S5629331 A JPS5629331 A JP S5629331A JP 10536979 A JP10536979 A JP 10536979A JP 10536979 A JP10536979 A JP 10536979A JP S5629331 A JPS5629331 A JP S5629331A
Authority
JP
Japan
Prior art keywords
rinsing
water
shower
nitrogen gas
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10536979A
Other languages
Japanese (ja)
Inventor
Hiromi Konaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10536979A priority Critical patent/JPS5629331A/en
Publication of JPS5629331A publication Critical patent/JPS5629331A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H01L21/3046—Mechanical treatment, e.g. grinding, polishing, cutting using blasting, e.g. sand-blasting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To always preferably and effectively rinse in shower in a water rinsing device by preparing an atmosphere which is necessary to retain the purity of rinsing water in a rinsing tank when rinsing in the tank. CONSTITUTION:After spraying rinsing water such as highly pure water from spraying tubes 2 starts spraying, a cover 6 is closed, and nitrogen gas is injected from an injection tube 7 to retain nitrogen gas atmosphere in a rinsing tank 1 during shower rinsing. Air purified through gas adsorber such as activated charcoal is injected instead of the nitrogen gas. In this manner it can always preferably and effectively rinse in shower.
JP10536979A 1979-08-18 1979-08-18 Water rinsing device Pending JPS5629331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10536979A JPS5629331A (en) 1979-08-18 1979-08-18 Water rinsing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10536979A JPS5629331A (en) 1979-08-18 1979-08-18 Water rinsing device

Publications (1)

Publication Number Publication Date
JPS5629331A true JPS5629331A (en) 1981-03-24

Family

ID=14405789

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10536979A Pending JPS5629331A (en) 1979-08-18 1979-08-18 Water rinsing device

Country Status (1)

Country Link
JP (1) JPS5629331A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60246639A (en) * 1984-05-21 1985-12-06 Fujitsu Ltd Wet processing method for wafer
US5261431A (en) * 1991-04-02 1993-11-16 Tokyo Electron Limited Washing apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60246639A (en) * 1984-05-21 1985-12-06 Fujitsu Ltd Wet processing method for wafer
US5261431A (en) * 1991-04-02 1993-11-16 Tokyo Electron Limited Washing apparatus

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