JPS5622951B2 - - Google Patents

Info

Publication number
JPS5622951B2
JPS5622951B2 JP6159875A JP6159875A JPS5622951B2 JP S5622951 B2 JPS5622951 B2 JP S5622951B2 JP 6159875 A JP6159875 A JP 6159875A JP 6159875 A JP6159875 A JP 6159875A JP S5622951 B2 JPS5622951 B2 JP S5622951B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6159875A
Other languages
Japanese (ja)
Other versions
JPS51137681A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6159875A priority Critical patent/JPS51137681A/en
Publication of JPS51137681A publication Critical patent/JPS51137681A/en
Publication of JPS5622951B2 publication Critical patent/JPS5622951B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP6159875A 1975-05-23 1975-05-23 Sputtering apparatus Granted JPS51137681A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6159875A JPS51137681A (en) 1975-05-23 1975-05-23 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6159875A JPS51137681A (en) 1975-05-23 1975-05-23 Sputtering apparatus

Publications (2)

Publication Number Publication Date
JPS51137681A JPS51137681A (en) 1976-11-27
JPS5622951B2 true JPS5622951B2 (en) 1981-05-28

Family

ID=13175739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6159875A Granted JPS51137681A (en) 1975-05-23 1975-05-23 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS51137681A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53132482A (en) * 1977-04-26 1978-11-18 Ulvac Corp High gain sputtering evaporation apparatus consuming material to be evaporated uniformly
JPS5861461U (en) * 1981-10-19 1983-04-25 富士通株式会社 sputtering equipment

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023382A (en) * 1973-07-05 1975-03-13
JPS50109185A (en) * 1974-01-31 1975-08-28
JPS50140381A (en) * 1974-04-30 1975-11-11

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023382A (en) * 1973-07-05 1975-03-13
JPS50109185A (en) * 1974-01-31 1975-08-28
JPS50140381A (en) * 1974-04-30 1975-11-11

Also Published As

Publication number Publication date
JPS51137681A (en) 1976-11-27

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