JPS51137681A - Sputtering apparatus - Google Patents
Sputtering apparatusInfo
- Publication number
- JPS51137681A JPS51137681A JP6159875A JP6159875A JPS51137681A JP S51137681 A JPS51137681 A JP S51137681A JP 6159875 A JP6159875 A JP 6159875A JP 6159875 A JP6159875 A JP 6159875A JP S51137681 A JPS51137681 A JP S51137681A
- Authority
- JP
- Japan
- Prior art keywords
- sputtering apparatus
- even under
- under low
- glow discharge
- generated even
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:A high efficient sputtering apparatus wherein glow discharge can be surely generated even under low gas pressures.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6159875A JPS51137681A (en) | 1975-05-23 | 1975-05-23 | Sputtering apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6159875A JPS51137681A (en) | 1975-05-23 | 1975-05-23 | Sputtering apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51137681A true JPS51137681A (en) | 1976-11-27 |
JPS5622951B2 JPS5622951B2 (en) | 1981-05-28 |
Family
ID=13175739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6159875A Granted JPS51137681A (en) | 1975-05-23 | 1975-05-23 | Sputtering apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51137681A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53132482A (en) * | 1977-04-26 | 1978-11-18 | Ulvac Corp | High gain sputtering evaporation apparatus consuming material to be evaporated uniformly |
JPS5861461U (en) * | 1981-10-19 | 1983-04-25 | 富士通株式会社 | sputtering equipment |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5023382A (en) * | 1973-07-05 | 1975-03-13 | ||
JPS50109185A (en) * | 1974-01-31 | 1975-08-28 | ||
JPS50140381A (en) * | 1974-04-30 | 1975-11-11 |
-
1975
- 1975-05-23 JP JP6159875A patent/JPS51137681A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5023382A (en) * | 1973-07-05 | 1975-03-13 | ||
JPS50109185A (en) * | 1974-01-31 | 1975-08-28 | ||
JPS50140381A (en) * | 1974-04-30 | 1975-11-11 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53132482A (en) * | 1977-04-26 | 1978-11-18 | Ulvac Corp | High gain sputtering evaporation apparatus consuming material to be evaporated uniformly |
JPS564148B2 (en) * | 1977-04-26 | 1981-01-28 | ||
JPS5861461U (en) * | 1981-10-19 | 1983-04-25 | 富士通株式会社 | sputtering equipment |
Also Published As
Publication number | Publication date |
---|---|
JPS5622951B2 (en) | 1981-05-28 |
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