JPS5621147B2 - - Google Patents
Info
- Publication number
- JPS5621147B2 JPS5621147B2 JP11452474A JP11452474A JPS5621147B2 JP S5621147 B2 JPS5621147 B2 JP S5621147B2 JP 11452474 A JP11452474 A JP 11452474A JP 11452474 A JP11452474 A JP 11452474A JP S5621147 B2 JPS5621147 B2 JP S5621147B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11452474A JPS5621147B2 (en:Method) | 1974-10-04 | 1974-10-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11452474A JPS5621147B2 (en:Method) | 1974-10-04 | 1974-10-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5140874A JPS5140874A (en:Method) | 1976-04-06 |
| JPS5621147B2 true JPS5621147B2 (en:Method) | 1981-05-18 |
Family
ID=14639899
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11452474A Expired JPS5621147B2 (en:Method) | 1974-10-04 | 1974-10-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5621147B2 (en:Method) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57147634A (en) * | 1981-03-09 | 1982-09-11 | Hoya Corp | Photomask blank |
| JPS628331Y2 (en:Method) * | 1981-03-16 | 1987-02-26 | ||
| JPS57161727A (en) * | 1981-03-30 | 1982-10-05 | Ricoh Co Ltd | Manufacture of electrochromatic film |
| JPS6090336A (ja) * | 1983-10-24 | 1985-05-21 | Toppan Printing Co Ltd | クロムマスクブランクの製造方法 |
| JPS61170743A (ja) * | 1985-01-25 | 1986-08-01 | Toppan Printing Co Ltd | フオトマスクブランクの製造法 |
| JPS61176934A (ja) * | 1985-01-31 | 1986-08-08 | Toppan Printing Co Ltd | フオトマスクブランクの製造方法 |
| JPH0690502B2 (ja) * | 1987-07-23 | 1994-11-14 | 凸版印刷株式会社 | フォトマスクブランクの製造法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3814641A (en) * | 1972-07-20 | 1974-06-04 | Instr Inc | Process of fabricating silicon photomask |
| JPS564906B2 (en:Method) * | 1972-08-04 | 1981-02-02 |
-
1974
- 1974-10-04 JP JP11452474A patent/JPS5621147B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5140874A (en:Method) | 1976-04-06 |