JPS5621147B2 - - Google Patents

Info

Publication number
JPS5621147B2
JPS5621147B2 JP11452474A JP11452474A JPS5621147B2 JP S5621147 B2 JPS5621147 B2 JP S5621147B2 JP 11452474 A JP11452474 A JP 11452474A JP 11452474 A JP11452474 A JP 11452474A JP S5621147 B2 JPS5621147 B2 JP S5621147B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11452474A
Other languages
Japanese (ja)
Other versions
JPS5140874A (cs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11452474A priority Critical patent/JPS5621147B2/ja
Publication of JPS5140874A publication Critical patent/JPS5140874A/ja
Publication of JPS5621147B2 publication Critical patent/JPS5621147B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
JP11452474A 1974-10-04 1974-10-04 Expired JPS5621147B2 (cs)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11452474A JPS5621147B2 (cs) 1974-10-04 1974-10-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11452474A JPS5621147B2 (cs) 1974-10-04 1974-10-04

Publications (2)

Publication Number Publication Date
JPS5140874A JPS5140874A (cs) 1976-04-06
JPS5621147B2 true JPS5621147B2 (cs) 1981-05-18

Family

ID=14639899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11452474A Expired JPS5621147B2 (cs) 1974-10-04 1974-10-04

Country Status (1)

Country Link
JP (1) JPS5621147B2 (cs)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57147634A (en) * 1981-03-09 1982-09-11 Hoya Corp Photomask blank
JPS628331Y2 (cs) * 1981-03-16 1987-02-26
JPS57161727A (en) * 1981-03-30 1982-10-05 Ricoh Co Ltd Manufacture of electrochromatic film
JPS6090336A (ja) * 1983-10-24 1985-05-21 Toppan Printing Co Ltd クロムマスクブランクの製造方法
JPS61170743A (ja) * 1985-01-25 1986-08-01 Toppan Printing Co Ltd フオトマスクブランクの製造法
JPS61176934A (ja) * 1985-01-31 1986-08-08 Toppan Printing Co Ltd フオトマスクブランクの製造方法
JPH0690502B2 (ja) * 1987-07-23 1994-11-14 凸版印刷株式会社 フォトマスクブランクの製造法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3814641A (en) * 1972-07-20 1974-06-04 Instr Inc Process of fabricating silicon photomask
JPS564906B2 (cs) * 1972-08-04 1981-02-02

Also Published As

Publication number Publication date
JPS5140874A (cs) 1976-04-06

Similar Documents

Publication Publication Date Title
FR2257640A1 (cs)
FI752127A7 (cs)
FI750894A7 (cs)
AU496555B2 (cs)
AU7138274A (cs)
BE836983A (cs)
BE829576A (cs)
AU480759A (cs)
AU481101A (cs)
AU481291A (cs)
AU481296A (cs)
AU481375A (cs)
AU481523A (cs)
AU481898A (cs)
AU482041A (cs)
AU482110A (cs)
AU482208A (cs)
AU480757A (cs)
BG19867A1 (cs)
AU7253373A (cs)
BG19847A1 (cs)
BE832276A (cs)
BE834963A (cs)
AU479870A (cs)
BG19694A1 (cs)