JPS5619619B2 - - Google Patents

Info

Publication number
JPS5619619B2
JPS5619619B2 JP8533273A JP8533273A JPS5619619B2 JP S5619619 B2 JPS5619619 B2 JP S5619619B2 JP 8533273 A JP8533273 A JP 8533273A JP 8533273 A JP8533273 A JP 8533273A JP S5619619 B2 JPS5619619 B2 JP S5619619B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8533273A
Other languages
Japanese (ja)
Other versions
JPS5036203A (xx
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8533273A priority Critical patent/JPS5619619B2/ja
Priority to GB3323774A priority patent/GB1442934A/en
Publication of JPS5036203A publication Critical patent/JPS5036203A/ja
Priority to US05/689,874 priority patent/US4105450A/en
Publication of JPS5619619B2 publication Critical patent/JPS5619619B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP8533273A 1973-07-27 1973-07-27 Expired JPS5619619B2 (xx)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8533273A JPS5619619B2 (xx) 1973-07-27 1973-07-27
GB3323774A GB1442934A (en) 1973-07-27 1974-07-26 Light-sensitive naphtho-quinone diazide composition
US05/689,874 US4105450A (en) 1973-07-27 1976-05-25 Spectrally sensitized positive light-sensitive o-quinone diazide containing composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8533273A JPS5619619B2 (xx) 1973-07-27 1973-07-27

Publications (2)

Publication Number Publication Date
JPS5036203A JPS5036203A (xx) 1975-04-05
JPS5619619B2 true JPS5619619B2 (xx) 1981-05-08

Family

ID=13855667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8533273A Expired JPS5619619B2 (xx) 1973-07-27 1973-07-27

Country Status (2)

Country Link
JP (1) JPS5619619B2 (xx)
GB (1) GB1442934A (xx)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5590943A (en) * 1978-12-28 1980-07-10 Fuji Photo Film Co Ltd Photosensitive material and image forming method applicable thereto
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
JPS61219951A (ja) * 1985-03-27 1986-09-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性組成物
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition
EP0737895B1 (en) * 1995-04-10 1999-09-08 Shipley Company LLC Photoresist with photoactive compound mixtures
WO2008078622A1 (ja) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法

Also Published As

Publication number Publication date
JPS5036203A (xx) 1975-04-05
GB1442934A (en) 1976-07-14

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