JPS5615034A - Manufacture of integrated circuit mask - Google Patents
Manufacture of integrated circuit maskInfo
- Publication number
- JPS5615034A JPS5615034A JP9029879A JP9029879A JPS5615034A JP S5615034 A JPS5615034 A JP S5615034A JP 9029879 A JP9029879 A JP 9029879A JP 9029879 A JP9029879 A JP 9029879A JP S5615034 A JPS5615034 A JP S5615034A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- integrated circuit
- representing
- manufacture
- expanded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To shorten a digitizing time of data in a integrated circuit and reduce the number of digitized mistakes thereof by expanding and reverse-transcribing a pattern representing buried diffused region of an integrated circuit element and forming the pattern representing separately diffused regions. CONSTITUTION:The first pattern 10 representing buried diffused region of an integrated circuit element is formed with digitized data. Further, the first pattern 10 is expanded by the digitized data to form an expanded pattern 11. Then, the expanded pattern 11 is reverse-transcribed to form the second pattern 12 representing the separately diffused regions of the integrated circuit element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9029879A JPS5615034A (en) | 1979-07-18 | 1979-07-18 | Manufacture of integrated circuit mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9029879A JPS5615034A (en) | 1979-07-18 | 1979-07-18 | Manufacture of integrated circuit mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5615034A true JPS5615034A (en) | 1981-02-13 |
Family
ID=13994626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9029879A Pending JPS5615034A (en) | 1979-07-18 | 1979-07-18 | Manufacture of integrated circuit mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5615034A (en) |
-
1979
- 1979-07-18 JP JP9029879A patent/JPS5615034A/en active Pending
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