JPS5615034A - Manufacture of integrated circuit mask - Google Patents

Manufacture of integrated circuit mask

Info

Publication number
JPS5615034A
JPS5615034A JP9029879A JP9029879A JPS5615034A JP S5615034 A JPS5615034 A JP S5615034A JP 9029879 A JP9029879 A JP 9029879A JP 9029879 A JP9029879 A JP 9029879A JP S5615034 A JPS5615034 A JP S5615034A
Authority
JP
Japan
Prior art keywords
pattern
integrated circuit
representing
manufacture
expanded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9029879A
Other languages
Japanese (ja)
Inventor
Hiroshi Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP9029879A priority Critical patent/JPS5615034A/en
Publication of JPS5615034A publication Critical patent/JPS5615034A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/74Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To shorten a digitizing time of data in a integrated circuit and reduce the number of digitized mistakes thereof by expanding and reverse-transcribing a pattern representing buried diffused region of an integrated circuit element and forming the pattern representing separately diffused regions. CONSTITUTION:The first pattern 10 representing buried diffused region of an integrated circuit element is formed with digitized data. Further, the first pattern 10 is expanded by the digitized data to form an expanded pattern 11. Then, the expanded pattern 11 is reverse-transcribed to form the second pattern 12 representing the separately diffused regions of the integrated circuit element.
JP9029879A 1979-07-18 1979-07-18 Manufacture of integrated circuit mask Pending JPS5615034A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9029879A JPS5615034A (en) 1979-07-18 1979-07-18 Manufacture of integrated circuit mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9029879A JPS5615034A (en) 1979-07-18 1979-07-18 Manufacture of integrated circuit mask

Publications (1)

Publication Number Publication Date
JPS5615034A true JPS5615034A (en) 1981-02-13

Family

ID=13994626

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9029879A Pending JPS5615034A (en) 1979-07-18 1979-07-18 Manufacture of integrated circuit mask

Country Status (1)

Country Link
JP (1) JPS5615034A (en)

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