JPS56138923A - Adjusting method for focussing - Google Patents

Adjusting method for focussing

Info

Publication number
JPS56138923A
JPS56138923A JP4140980A JP4140980A JPS56138923A JP S56138923 A JPS56138923 A JP S56138923A JP 4140980 A JP4140980 A JP 4140980A JP 4140980 A JP4140980 A JP 4140980A JP S56138923 A JPS56138923 A JP S56138923A
Authority
JP
Japan
Prior art keywords
electron beam
mark
excitation
approach
focussing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4140980A
Other languages
Japanese (ja)
Inventor
Takao Namae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP4140980A priority Critical patent/JPS56138923A/en
Publication of JPS56138923A publication Critical patent/JPS56138923A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enable to perform a precise adjustment of focussing by a method wherein an electron beam is scanned on the reference mark on a substrate and the excitation of an electron lens system is controlled in such manner that the identically strengthed signaling time intervals obtained from the boundary section of the mark will approach an ideal value. CONSTITUTION:The signal reflected from the mark and its vicinity is detected by scanning an electron beam on the heavy metal mark provided on a sample substrate, and the focus of the electron beam is adjusted by controlling the excitation of the electron beam system in such manner that signaling time intervals of the identical strength which is almost rectangular pulse-shaped signal will approach an ideal value (for example, H). Accordingly, as no differentiated waveform is utilized in the focus adjustment, there exists no emphasis due to noise of differentiation and a precise focus adjustment can be performed.
JP4140980A 1980-03-31 1980-03-31 Adjusting method for focussing Pending JPS56138923A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4140980A JPS56138923A (en) 1980-03-31 1980-03-31 Adjusting method for focussing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4140980A JPS56138923A (en) 1980-03-31 1980-03-31 Adjusting method for focussing

Publications (1)

Publication Number Publication Date
JPS56138923A true JPS56138923A (en) 1981-10-29

Family

ID=12607552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4140980A Pending JPS56138923A (en) 1980-03-31 1980-03-31 Adjusting method for focussing

Country Status (1)

Country Link
JP (1) JPS56138923A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63160143A (en) * 1986-12-24 1988-07-02 Seiko Instr & Electronics Ltd Convergence measuring method for focused charged particle
JPS63178523A (en) * 1987-01-20 1988-07-22 Toshiba Corp Automatic focusing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63160143A (en) * 1986-12-24 1988-07-02 Seiko Instr & Electronics Ltd Convergence measuring method for focused charged particle
JPS63178523A (en) * 1987-01-20 1988-07-22 Toshiba Corp Automatic focusing method

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