JPS5613723A - Inspection device for picture by electron ray - Google Patents
Inspection device for picture by electron rayInfo
- Publication number
- JPS5613723A JPS5613723A JP8811279A JP8811279A JPS5613723A JP S5613723 A JPS5613723 A JP S5613723A JP 8811279 A JP8811279 A JP 8811279A JP 8811279 A JP8811279 A JP 8811279A JP S5613723 A JPS5613723 A JP S5613723A
- Authority
- JP
- Japan
- Prior art keywords
- electrons
- picture
- reflected electrons
- lens
- magnified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To increase the extracting speed of picture informations effectively by a method wherein a plurality of picture elements are magnified by an electronic optical system and simultaneously detected by a plurality of detectors. CONSTITUTION:Electrons irradiate a fixed area on a sample 7 through a trottle 2 and electromagnetic lenses 3, 4. The electrons are modulated on the surface of the sample, and the components in the horizontal direction of reflected electrons are magnified by an electromagnetic lens 8 and collide with a detector array. The reflected electrons are made binary 11 through respective independent amplifiers 10, and informations are processed, displayed and stored by a computer 12. Electron beams pass through the lens 4, and are electrostatically deflected 5 in the direction that is vertical to the surface of paper, and the reflected electrons synchronize with a moving base 13, are electrostatically deflected 6 in the direction that is reverse to the base 13 and are projected to the electromagnetic lens 8. The deflection 5, 6 is synchronized in the directions that are mutually reverse. According to this constitu tion, since two-dimensional pictures are transmitted to an information processing system partially and simultaneously, this method is close to a human pattern recognizing method, and is advantageous for increasing the speed of information processing and heightening its accuracy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8811279A JPS5613723A (en) | 1979-07-13 | 1979-07-13 | Inspection device for picture by electron ray |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8811279A JPS5613723A (en) | 1979-07-13 | 1979-07-13 | Inspection device for picture by electron ray |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5613723A true JPS5613723A (en) | 1981-02-10 |
Family
ID=13933793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8811279A Pending JPS5613723A (en) | 1979-07-13 | 1979-07-13 | Inspection device for picture by electron ray |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5613723A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE40221E1 (en) | 1997-08-19 | 2008-04-08 | Nikon Corporation | Object observation apparatus and object observation |
-
1979
- 1979-07-13 JP JP8811279A patent/JPS5613723A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE40221E1 (en) | 1997-08-19 | 2008-04-08 | Nikon Corporation | Object observation apparatus and object observation |
| USRE41665E1 (en) | 1997-08-19 | 2010-09-14 | Nikon Corporation | Object observation apparatus and object observation |
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