JPS5598829A - Method and device for selective treatment - Google Patents

Method and device for selective treatment

Info

Publication number
JPS5598829A
JPS5598829A JP617879A JP617879A JPS5598829A JP S5598829 A JPS5598829 A JP S5598829A JP 617879 A JP617879 A JP 617879A JP 617879 A JP617879 A JP 617879A JP S5598829 A JPS5598829 A JP S5598829A
Authority
JP
Japan
Prior art keywords
opening
area
television camera
mirror
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP617879A
Other languages
Japanese (ja)
Inventor
Takao Kawanabe
Soichi Tsuuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP6178A external-priority patent/JPS5392439A/en
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of JPS5598829A publication Critical patent/JPS5598829A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To raise the accuracy of treatment, by measuring the area of the opening of a mask, through which laser light is transmitted, through a television camera and adjusting the area of the opening when inradiating the laser light upon an electric insulator to selectively treat it.
CONSTITUTION: A photomask 1 to be treated is interposed between an objective lens 2 and a condensing lens 3 over an illumination lamp 4. A half mirror 5, an intermediate lens 6 and a television camera 7 are installed over the photomask 1. An iris mechanism made of four plates 9, which are driven by pulse motors 10, is provided near the mirror 5. Light from a laser oscillator 11 is transmitted through the opening 19 of the iris mechanism and reflected by the mirror and irradiated upon the mask 1. A measuring circuit 25 is connected to the television camera 7. A comparison and adjustment circuit 26 is operated by the output of the measuring circuit 25. The motors 10 are controlled by the output of the circuit 26 to regulate the area of the opening 19. The result of the regulation is monitored through a monitor television set 8.
COPYRIGHT: (C)1980,JPO&Japio
JP617879A 1978-01-05 1979-01-24 Method and device for selective treatment Pending JPS5598829A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6178A JPS5392439A (en) 1977-01-21 1978-01-05 Battery and electrode

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP60184198A Division JPS6175524A (en) 1985-08-23 1985-08-23 Selection processing apparatus

Publications (1)

Publication Number Publication Date
JPS5598829A true JPS5598829A (en) 1980-07-28

Family

ID=11463671

Family Applications (1)

Application Number Title Priority Date Filing Date
JP617879A Pending JPS5598829A (en) 1978-01-05 1979-01-24 Method and device for selective treatment

Country Status (1)

Country Link
JP (1) JPS5598829A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010729A (en) * 1983-06-30 1985-01-19 Fujitsu Ltd Pattern correcting exposing device
JPS6175524A (en) * 1985-08-23 1986-04-17 Hitachi Ltd Selection processing apparatus
JPH0279851A (en) * 1988-09-17 1990-03-20 Nidek Co Ltd Optical working device for correcting thin film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52125269A (en) * 1976-04-14 1977-10-20 Nec Corp Removing device for projecting defects from wafer
JPS53120377A (en) * 1977-03-30 1978-10-20 Nec Corp Laser machining apparatus for correction of photo masks

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52125269A (en) * 1976-04-14 1977-10-20 Nec Corp Removing device for projecting defects from wafer
JPS53120377A (en) * 1977-03-30 1978-10-20 Nec Corp Laser machining apparatus for correction of photo masks

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010729A (en) * 1983-06-30 1985-01-19 Fujitsu Ltd Pattern correcting exposing device
JPH0467183B2 (en) * 1983-06-30 1992-10-27 Fujitsu Ltd
JPS6175524A (en) * 1985-08-23 1986-04-17 Hitachi Ltd Selection processing apparatus
JPH0279851A (en) * 1988-09-17 1990-03-20 Nidek Co Ltd Optical working device for correcting thin film

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