JPS5593008A - Signal formation unit - Google Patents
Signal formation unitInfo
- Publication number
- JPS5593008A JPS5593008A JP195979A JP195979A JPS5593008A JP S5593008 A JPS5593008 A JP S5593008A JP 195979 A JP195979 A JP 195979A JP 195979 A JP195979 A JP 195979A JP S5593008 A JPS5593008 A JP S5593008A
- Authority
- JP
- Japan
- Prior art keywords
- gradient
- signal
- detected body
- way
- analog
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title abstract 2
- 238000000034 method Methods 0.000 abstract 2
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP195979A JPS5593008A (en) | 1979-01-09 | 1979-01-09 | Signal formation unit |
US06/215,341 US4332477A (en) | 1979-01-09 | 1980-12-11 | Flatness measuring apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP195979A JPS5593008A (en) | 1979-01-09 | 1979-01-09 | Signal formation unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5593008A true JPS5593008A (en) | 1980-07-15 |
JPH0149881B2 JPH0149881B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-10-26 |
Family
ID=11516122
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP195979A Granted JPS5593008A (en) | 1979-01-09 | 1979-01-09 | Signal formation unit |
Country Status (2)
Country | Link |
---|---|
US (1) | US4332477A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
JP (1) | JPS5593008A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61233312A (ja) * | 1985-04-09 | 1986-10-17 | Nippon Kogaku Kk <Nikon> | パタ−ン位置測定装置 |
JPWO2016016972A1 (ja) * | 2014-07-30 | 2017-06-01 | 有限会社ワイ・システムズ | 表面形状の測定方法および測定装置 |
CN112945150A (zh) * | 2021-02-02 | 2021-06-11 | 上海勘察设计研究院(集团)有限公司 | 一种基于三维激光扫描技术的大型构筑物平整度检测方法 |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56103420A (en) * | 1980-01-23 | 1981-08-18 | Hitachi Ltd | Compensating method for deflection distortion in charged particle beam apparatus |
JPS57139607A (en) * | 1981-02-23 | 1982-08-28 | Hitachi Ltd | Position measuring equipment |
JPS57161641A (en) * | 1981-03-31 | 1982-10-05 | Olympus Optical Co Ltd | Inspecting device for defect of surface |
DE3422143A1 (de) * | 1984-06-14 | 1985-12-19 | Josef Prof. Dr. Bille | Geraet zur wafer-inspektion |
DE3503858A1 (de) * | 1985-02-05 | 1986-08-21 | Daimler-Benz Ag, 7000 Stuttgart | Vorrichtung zur ermittlung von gestaltsfehlern niedriger ordnung |
US4747911A (en) * | 1986-10-23 | 1988-05-31 | Boise Cascade Corporation | Apparatus for measuring diagonal and simplex paper curl |
US4770536A (en) * | 1986-12-04 | 1988-09-13 | Moshe Golberstein | Reflective photometry instrument |
US4991964A (en) * | 1988-08-26 | 1991-02-12 | Texas Instruments Incorporated | Laser stress measurement apparatus and method |
WO1992008104A1 (en) * | 1990-10-24 | 1992-05-14 | Therma-Wave, Inc. | Apparatus for generating surface topographical images |
GB9205655D0 (en) * | 1992-03-14 | 1992-04-29 | Roke Manor Research | Improvements in or relating to surface curvature measurement |
US5745238A (en) * | 1992-12-22 | 1998-04-28 | International Business Machines Corporation | Apparatus and method for non-destructive inspection and/or measurement |
US5394247A (en) * | 1993-03-09 | 1995-02-28 | International Paper Company | Measurement of paper curl tendency using specular and diffuse light reflection |
US5781302A (en) * | 1996-07-22 | 1998-07-14 | Geneva Steel | Non-contact shape meter for flatness measurements |
US7123357B2 (en) * | 1997-09-22 | 2006-10-17 | Candela Instruments | Method of detecting and classifying scratches and particles on thin film disks or wafers |
US6665078B1 (en) | 1997-09-22 | 2003-12-16 | Candela Instruments | System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers |
US6897957B2 (en) * | 2001-03-26 | 2005-05-24 | Candela Instruments | Material independent optical profilometer |
US6757056B1 (en) | 2001-03-26 | 2004-06-29 | Candela Instruments | Combined high speed optical profilometer and ellipsometer |
US6031615A (en) | 1997-09-22 | 2000-02-29 | Candela Instruments | System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness |
US6909500B2 (en) * | 2001-03-26 | 2005-06-21 | Candela Instruments | Method of detecting and classifying scratches, particles and pits on thin film disks or wafers |
US6930765B2 (en) * | 2001-03-26 | 2005-08-16 | Kla-Tencor Technologies | Multiple spot size optical profilometer, ellipsometer, reflectometer and scatterometer |
US5986761A (en) * | 1998-07-06 | 1999-11-16 | Internatioanl Business Machines Corporation | Laser-based inspection tool for disk defects and curvature |
US6075604A (en) * | 1998-11-10 | 2000-06-13 | International Business Machines Corporation | Apparatus for measuring curvature of magnetic read/write head sliders |
US7061601B2 (en) * | 1999-07-02 | 2006-06-13 | Kla-Tencor Technologies Corporation | System and method for double sided optical inspection of thin film disks or wafers |
US6882437B2 (en) * | 2002-04-19 | 2005-04-19 | Kla-Tencor Technologies | Method of detecting the thickness of thin film disks or wafers |
US7075741B1 (en) | 2004-06-14 | 2006-07-11 | Kla Tencor Technologues Corporation | System and method for automatically determining magnetic eccentricity of a disk |
US7396022B1 (en) | 2004-09-28 | 2008-07-08 | Kla-Tencor Technologies Corp. | System and method for optimizing wafer flatness at high rotational speeds |
US7201799B1 (en) | 2004-11-24 | 2007-04-10 | Kla-Tencor Technologies Corporation | System and method for classifying, detecting, and counting micropipes |
US7684032B1 (en) | 2005-01-06 | 2010-03-23 | Kla-Tencor Corporation | Multi-wavelength system and method for detecting epitaxial layer defects |
JP6434788B2 (ja) * | 2014-03-06 | 2018-12-05 | パナソニック インテレクチュアル プロパティ コーポレーション オブ アメリカPanasonic Intellectual Property Corporation of America | 計測システム、計測方法およびビジョンチップ |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3768910A (en) * | 1972-05-25 | 1973-10-30 | Zygo Corp | Detecting the position of a surface by focus modulating the illuminating beam |
US3857637A (en) * | 1973-01-10 | 1974-12-31 | Ppg Industries Inc | Surface distortion analyzer |
US3885875A (en) * | 1974-07-29 | 1975-05-27 | Zygo Corp | Noncontact surface profilometer |
JPS527764A (en) * | 1975-07-08 | 1977-01-21 | Toshiba Corp | Dimension meter |
-
1979
- 1979-01-09 JP JP195979A patent/JPS5593008A/ja active Granted
-
1980
- 1980-12-11 US US06/215,341 patent/US4332477A/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61233312A (ja) * | 1985-04-09 | 1986-10-17 | Nippon Kogaku Kk <Nikon> | パタ−ン位置測定装置 |
JPWO2016016972A1 (ja) * | 2014-07-30 | 2017-06-01 | 有限会社ワイ・システムズ | 表面形状の測定方法および測定装置 |
CN112945150A (zh) * | 2021-02-02 | 2021-06-11 | 上海勘察设计研究院(集团)有限公司 | 一种基于三维激光扫描技术的大型构筑物平整度检测方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0149881B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-10-26 |
US4332477A (en) | 1982-06-01 |
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