JPS5593008A - Signal formation unit - Google Patents

Signal formation unit

Info

Publication number
JPS5593008A
JPS5593008A JP195979A JP195979A JPS5593008A JP S5593008 A JPS5593008 A JP S5593008A JP 195979 A JP195979 A JP 195979A JP 195979 A JP195979 A JP 195979A JP S5593008 A JPS5593008 A JP S5593008A
Authority
JP
Japan
Prior art keywords
gradient
signal
detected body
way
analog
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP195979A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0149881B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Masatoshi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP195979A priority Critical patent/JPS5593008A/ja
Publication of JPS5593008A publication Critical patent/JPS5593008A/ja
Priority to US06/215,341 priority patent/US4332477A/en
Publication of JPH0149881B2 publication Critical patent/JPH0149881B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/26Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
JP195979A 1979-01-09 1979-01-09 Signal formation unit Granted JPS5593008A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP195979A JPS5593008A (en) 1979-01-09 1979-01-09 Signal formation unit
US06/215,341 US4332477A (en) 1979-01-09 1980-12-11 Flatness measuring apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP195979A JPS5593008A (en) 1979-01-09 1979-01-09 Signal formation unit

Publications (2)

Publication Number Publication Date
JPS5593008A true JPS5593008A (en) 1980-07-15
JPH0149881B2 JPH0149881B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-10-26

Family

ID=11516122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP195979A Granted JPS5593008A (en) 1979-01-09 1979-01-09 Signal formation unit

Country Status (2)

Country Link
US (1) US4332477A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5593008A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61233312A (ja) * 1985-04-09 1986-10-17 Nippon Kogaku Kk <Nikon> パタ−ン位置測定装置
JPWO2016016972A1 (ja) * 2014-07-30 2017-06-01 有限会社ワイ・システムズ 表面形状の測定方法および測定装置
CN112945150A (zh) * 2021-02-02 2021-06-11 上海勘察设计研究院(集团)有限公司 一种基于三维激光扫描技术的大型构筑物平整度检测方法

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56103420A (en) * 1980-01-23 1981-08-18 Hitachi Ltd Compensating method for deflection distortion in charged particle beam apparatus
JPS57139607A (en) * 1981-02-23 1982-08-28 Hitachi Ltd Position measuring equipment
JPS57161641A (en) * 1981-03-31 1982-10-05 Olympus Optical Co Ltd Inspecting device for defect of surface
DE3422143A1 (de) * 1984-06-14 1985-12-19 Josef Prof. Dr. Bille Geraet zur wafer-inspektion
DE3503858A1 (de) * 1985-02-05 1986-08-21 Daimler-Benz Ag, 7000 Stuttgart Vorrichtung zur ermittlung von gestaltsfehlern niedriger ordnung
US4747911A (en) * 1986-10-23 1988-05-31 Boise Cascade Corporation Apparatus for measuring diagonal and simplex paper curl
US4770536A (en) * 1986-12-04 1988-09-13 Moshe Golberstein Reflective photometry instrument
US4991964A (en) * 1988-08-26 1991-02-12 Texas Instruments Incorporated Laser stress measurement apparatus and method
WO1992008104A1 (en) * 1990-10-24 1992-05-14 Therma-Wave, Inc. Apparatus for generating surface topographical images
GB9205655D0 (en) * 1992-03-14 1992-04-29 Roke Manor Research Improvements in or relating to surface curvature measurement
US5745238A (en) * 1992-12-22 1998-04-28 International Business Machines Corporation Apparatus and method for non-destructive inspection and/or measurement
US5394247A (en) * 1993-03-09 1995-02-28 International Paper Company Measurement of paper curl tendency using specular and diffuse light reflection
US5781302A (en) * 1996-07-22 1998-07-14 Geneva Steel Non-contact shape meter for flatness measurements
US7123357B2 (en) * 1997-09-22 2006-10-17 Candela Instruments Method of detecting and classifying scratches and particles on thin film disks or wafers
US6665078B1 (en) 1997-09-22 2003-12-16 Candela Instruments System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers
US6897957B2 (en) * 2001-03-26 2005-05-24 Candela Instruments Material independent optical profilometer
US6757056B1 (en) 2001-03-26 2004-06-29 Candela Instruments Combined high speed optical profilometer and ellipsometer
US6031615A (en) 1997-09-22 2000-02-29 Candela Instruments System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness
US6909500B2 (en) * 2001-03-26 2005-06-21 Candela Instruments Method of detecting and classifying scratches, particles and pits on thin film disks or wafers
US6930765B2 (en) * 2001-03-26 2005-08-16 Kla-Tencor Technologies Multiple spot size optical profilometer, ellipsometer, reflectometer and scatterometer
US5986761A (en) * 1998-07-06 1999-11-16 Internatioanl Business Machines Corporation Laser-based inspection tool for disk defects and curvature
US6075604A (en) * 1998-11-10 2000-06-13 International Business Machines Corporation Apparatus for measuring curvature of magnetic read/write head sliders
US7061601B2 (en) * 1999-07-02 2006-06-13 Kla-Tencor Technologies Corporation System and method for double sided optical inspection of thin film disks or wafers
US6882437B2 (en) * 2002-04-19 2005-04-19 Kla-Tencor Technologies Method of detecting the thickness of thin film disks or wafers
US7075741B1 (en) 2004-06-14 2006-07-11 Kla Tencor Technologues Corporation System and method for automatically determining magnetic eccentricity of a disk
US7396022B1 (en) 2004-09-28 2008-07-08 Kla-Tencor Technologies Corp. System and method for optimizing wafer flatness at high rotational speeds
US7201799B1 (en) 2004-11-24 2007-04-10 Kla-Tencor Technologies Corporation System and method for classifying, detecting, and counting micropipes
US7684032B1 (en) 2005-01-06 2010-03-23 Kla-Tencor Corporation Multi-wavelength system and method for detecting epitaxial layer defects
JP6434788B2 (ja) * 2014-03-06 2018-12-05 パナソニック インテレクチュアル プロパティ コーポレーション オブ アメリカPanasonic Intellectual Property Corporation of America 計測システム、計測方法およびビジョンチップ

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3768910A (en) * 1972-05-25 1973-10-30 Zygo Corp Detecting the position of a surface by focus modulating the illuminating beam
US3857637A (en) * 1973-01-10 1974-12-31 Ppg Industries Inc Surface distortion analyzer
US3885875A (en) * 1974-07-29 1975-05-27 Zygo Corp Noncontact surface profilometer
JPS527764A (en) * 1975-07-08 1977-01-21 Toshiba Corp Dimension meter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61233312A (ja) * 1985-04-09 1986-10-17 Nippon Kogaku Kk <Nikon> パタ−ン位置測定装置
JPWO2016016972A1 (ja) * 2014-07-30 2017-06-01 有限会社ワイ・システムズ 表面形状の測定方法および測定装置
CN112945150A (zh) * 2021-02-02 2021-06-11 上海勘察设计研究院(集团)有限公司 一种基于三维激光扫描技术的大型构筑物平整度检测方法

Also Published As

Publication number Publication date
JPH0149881B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-10-26
US4332477A (en) 1982-06-01

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