JPS558593B2 - - Google Patents

Info

Publication number
JPS558593B2
JPS558593B2 JP3286578A JP3286578A JPS558593B2 JP S558593 B2 JPS558593 B2 JP S558593B2 JP 3286578 A JP3286578 A JP 3286578A JP 3286578 A JP3286578 A JP 3286578A JP S558593 B2 JPS558593 B2 JP S558593B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3286578A
Other languages
Japanese (ja)
Other versions
JPS54125144A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3286578A priority Critical patent/JPS54125144A/ja
Publication of JPS54125144A publication Critical patent/JPS54125144A/ja
Publication of JPS558593B2 publication Critical patent/JPS558593B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP3286578A 1978-03-24 1978-03-24 Treating device using hydrogen fluoride-containing gas Granted JPS54125144A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3286578A JPS54125144A (en) 1978-03-24 1978-03-24 Treating device using hydrogen fluoride-containing gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3286578A JPS54125144A (en) 1978-03-24 1978-03-24 Treating device using hydrogen fluoride-containing gas

Publications (2)

Publication Number Publication Date
JPS54125144A JPS54125144A (en) 1979-09-28
JPS558593B2 true JPS558593B2 (enrdf_load_stackoverflow) 1980-03-05

Family

ID=12370739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3286578A Granted JPS54125144A (en) 1978-03-24 1978-03-24 Treating device using hydrogen fluoride-containing gas

Country Status (1)

Country Link
JP (1) JPS54125144A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5954227A (ja) * 1982-09-21 1984-03-29 Tokyo Denshi Kagaku Kabushiki 乾式パタ−ン形成方法
JPS59166675A (ja) * 1983-03-11 1984-09-20 Fujitsu Ltd エツチング装置
JPH03107479A (ja) * 1989-09-22 1991-05-07 Nec Corp ドライエッチング装置
KR930005440B1 (ko) * 1989-10-02 1993-06-21 다이닛뽕 스쿠린 세이소오 가부시키가이샤 절연막의 선택적 제거방법
JPH07169756A (ja) * 1994-11-07 1995-07-04 Semiconductor Energy Lab Co Ltd プラズマエッチング方法
JPH08306675A (ja) * 1996-05-13 1996-11-22 Semiconductor Energy Lab Co Ltd プラズマエッチング方法
KR101874821B1 (ko) * 2016-04-05 2018-07-06 주식회사 테스 저온 공정을 이용한 실리콘산화막의 선택적 식각 방법
DE102019218727A1 (de) * 2019-12-03 2021-06-10 Robert Bosch Gmbh Vorrichtung und verfahren zum bearbeiten mindestens eines halbleiter-substrates

Also Published As

Publication number Publication date
JPS54125144A (en) 1979-09-28

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