JPS558592B2 - - Google Patents

Info

Publication number
JPS558592B2
JPS558592B2 JP3286478A JP3286478A JPS558592B2 JP S558592 B2 JPS558592 B2 JP S558592B2 JP 3286478 A JP3286478 A JP 3286478A JP 3286478 A JP3286478 A JP 3286478A JP S558592 B2 JPS558592 B2 JP S558592B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3286478A
Other languages
Japanese (ja)
Other versions
JPS54125143A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3286478A priority Critical patent/JPS54125143A/ja
Publication of JPS54125143A publication Critical patent/JPS54125143A/ja
Publication of JPS558592B2 publication Critical patent/JPS558592B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP3286478A 1978-03-24 1978-03-24 Treating device using hydrogen fluoride-containing gas Granted JPS54125143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3286478A JPS54125143A (en) 1978-03-24 1978-03-24 Treating device using hydrogen fluoride-containing gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3286478A JPS54125143A (en) 1978-03-24 1978-03-24 Treating device using hydrogen fluoride-containing gas

Publications (2)

Publication Number Publication Date
JPS54125143A JPS54125143A (en) 1979-09-28
JPS558592B2 true JPS558592B2 (enrdf_load_stackoverflow) 1980-03-05

Family

ID=12370709

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3286478A Granted JPS54125143A (en) 1978-03-24 1978-03-24 Treating device using hydrogen fluoride-containing gas

Country Status (1)

Country Link
JP (1) JPS54125143A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100558U (enrdf_load_stackoverflow) * 1980-12-12 1982-06-21

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6067673A (ja) * 1983-09-22 1985-04-18 Semiconductor Energy Lab Co Ltd プラズマ気相反応方法
JPH03107479A (ja) * 1989-09-22 1991-05-07 Nec Corp ドライエッチング装置
JPH07169756A (ja) * 1994-11-07 1995-07-04 Semiconductor Energy Lab Co Ltd プラズマエッチング方法
JPH08306675A (ja) * 1996-05-13 1996-11-22 Semiconductor Energy Lab Co Ltd プラズマエッチング方法
CN103981522B (zh) * 2014-04-17 2016-03-09 宁波鱼化龙机电科技有限公司 一种陶瓷插芯钢线蚀刻机
KR101874821B1 (ko) * 2016-04-05 2018-07-06 주식회사 테스 저온 공정을 이용한 실리콘산화막의 선택적 식각 방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100558U (enrdf_load_stackoverflow) * 1980-12-12 1982-06-21

Also Published As

Publication number Publication date
JPS54125143A (en) 1979-09-28

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