JPS5576065A - Vacuum deposition unit - Google Patents

Vacuum deposition unit

Info

Publication number
JPS5576065A
JPS5576065A JP14869478A JP14869478A JPS5576065A JP S5576065 A JPS5576065 A JP S5576065A JP 14869478 A JP14869478 A JP 14869478A JP 14869478 A JP14869478 A JP 14869478A JP S5576065 A JPS5576065 A JP S5576065A
Authority
JP
Japan
Prior art keywords
substrate
shelter
evaporation source
thickness
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14869478A
Other languages
Japanese (ja)
Other versions
JPS5940225B2 (en
Inventor
Kenzo Ochi
Osamu Yamazaki
Kiyotaka Wasa
Shigeru Hayakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14869478A priority Critical patent/JPS5940225B2/en
Publication of JPS5576065A publication Critical patent/JPS5576065A/en
Publication of JPS5940225B2 publication Critical patent/JPS5940225B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a coating of uniform thickness, by metallizing a substrate with an evaporation source material while the substrate being moved relatively to a shelter which shelters the substrate partially from the evaporation source. CONSTITUTION:The main part of the vacuum deposition unit is constituted of a disc evaporation source 11, a substrate support 12 which is installed at a position facing to the evaporation source 11, and a shelter 14 of blade shape arranged between the evaporation source 11, and the substrate support 12, the support 12 being attached with a substrate 13. The shelter 14 is rotatably supported around the center axis 15 of the evaporation source 11. In metallizing the substrate 13 with material contained in the evaporation source 11, the thickness distribution of metallized coating is shown by a curve 101 of Figure when the shelter is not used, while when the shelter 14 of a shape symmetrical with respect to the axis 15 is used, the coating thickness is made uniform as shown by a curve 102 of Figure. In that case, the effective area of the portion of the shelter 14 facing to the surface of the substrate 13 of larger cating thickness is made broader, and that of portions facing to the surface of the substrate 13 of smaller coating thickness is made narrower. This shape is determined by an angle made by straight lines passing through the center and intersections of an arbitrary circle with center at the axis 15 and the contour of the shelter 14, e.g., alpha, or beta shown by Figure.
JP14869478A 1978-11-30 1978-11-30 Vapor deposition equipment Expired JPS5940225B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14869478A JPS5940225B2 (en) 1978-11-30 1978-11-30 Vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14869478A JPS5940225B2 (en) 1978-11-30 1978-11-30 Vapor deposition equipment

Publications (2)

Publication Number Publication Date
JPS5576065A true JPS5576065A (en) 1980-06-07
JPS5940225B2 JPS5940225B2 (en) 1984-09-28

Family

ID=15458501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14869478A Expired JPS5940225B2 (en) 1978-11-30 1978-11-30 Vapor deposition equipment

Country Status (1)

Country Link
JP (1) JPS5940225B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5861461U (en) * 1981-10-19 1983-04-25 富士通株式会社 sputtering equipment
CN115305439A (en) * 2022-07-21 2022-11-08 浙江众凌科技有限公司 High-strength metal shade

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS617133A (en) * 1984-06-19 1986-01-13 Nakamura Kiki Eng:Kk Conveyor line converter for conveyed load
JPH02108928U (en) * 1988-10-06 1990-08-30
JPH03192015A (en) * 1989-12-20 1991-08-21 Fujitsu Ltd Transfer equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5861461U (en) * 1981-10-19 1983-04-25 富士通株式会社 sputtering equipment
CN115305439A (en) * 2022-07-21 2022-11-08 浙江众凌科技有限公司 High-strength metal shade

Also Published As

Publication number Publication date
JPS5940225B2 (en) 1984-09-28

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