JPS5562858A - Sintering material with tenacity and abrasion resistance - Google Patents
Sintering material with tenacity and abrasion resistanceInfo
- Publication number
- JPS5562858A JPS5562858A JP13574578A JP13574578A JPS5562858A JP S5562858 A JPS5562858 A JP S5562858A JP 13574578 A JP13574578 A JP 13574578A JP 13574578 A JP13574578 A JP 13574578A JP S5562858 A JPS5562858 A JP S5562858A
- Authority
- JP
- Japan
- Prior art keywords
- tenacity
- abrasion resistance
- sintering material
- sintering
- abrasion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Ceramic Products (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13574578A JPS5562858A (en) | 1978-11-06 | 1978-11-06 | Sintering material with tenacity and abrasion resistance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13574578A JPS5562858A (en) | 1978-11-06 | 1978-11-06 | Sintering material with tenacity and abrasion resistance |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5562858A true JPS5562858A (en) | 1980-05-12 |
| JPS627149B2 JPS627149B2 (en:Method) | 1987-02-16 |
Family
ID=15158875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13574578A Granted JPS5562858A (en) | 1978-11-06 | 1978-11-06 | Sintering material with tenacity and abrasion resistance |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5562858A (en:Method) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5626771A (en) * | 1979-08-14 | 1981-03-14 | Sumitomo Electric Industries | Sintered body for cast iron cutting tool and its manufacture |
| JPS5860678A (ja) * | 1981-10-02 | 1983-04-11 | 三菱マテリアル株式会社 | 切削および耐摩耗工具用高靭性窒化硼素基超高圧焼結材料 |
| JPH01131067A (ja) * | 1987-11-18 | 1989-05-23 | Showa Denko Kk | 立方晶窒化ほう素焼結体の製造方法 |
| CN113896537A (zh) * | 2021-12-10 | 2022-01-07 | 山东金鸿新材料股份有限公司 | 一种碳化硼与碳化硅复合陶瓷的制备方法 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8518774B2 (en) | 2007-03-29 | 2013-08-27 | Micron Technology, Inc. | Manufacturing process for zero-capacitor random access memory circuits |
| US8064274B2 (en) | 2007-05-30 | 2011-11-22 | Micron Technology, Inc. | Integrated circuit having voltage generation circuitry for memory cell array, and method of operating and/or controlling same |
| US8773933B2 (en) | 2012-03-16 | 2014-07-08 | Micron Technology, Inc. | Techniques for accessing memory cells |
| US7947543B2 (en) | 2008-09-25 | 2011-05-24 | Micron Technology, Inc. | Recessed gate silicon-on-insulator floating body device with self-aligned lateral isolation |
| WO2010102106A2 (en) | 2009-03-04 | 2010-09-10 | Innovative Silicon Isi Sa | Techniques for forming a contact to a buried diffusion layer in a semiconductor memory device |
| US8748959B2 (en) | 2009-03-31 | 2014-06-10 | Micron Technology, Inc. | Semiconductor memory device |
| US8139418B2 (en) | 2009-04-27 | 2012-03-20 | Micron Technology, Inc. | Techniques for controlling a direct injection semiconductor memory device |
| US8508994B2 (en) | 2009-04-30 | 2013-08-13 | Micron Technology, Inc. | Semiconductor device with floating gate and electrically floating body |
| US8498157B2 (en) | 2009-05-22 | 2013-07-30 | Micron Technology, Inc. | Techniques for providing a direct injection semiconductor memory device |
| US9076543B2 (en) | 2009-07-27 | 2015-07-07 | Micron Technology, Inc. | Techniques for providing a direct injection semiconductor memory device |
| US8576631B2 (en) | 2010-03-04 | 2013-11-05 | Micron Technology, Inc. | Techniques for sensing a semiconductor memory device |
| US8547738B2 (en) | 2010-03-15 | 2013-10-01 | Micron Technology, Inc. | Techniques for providing a semiconductor memory device |
| US8411524B2 (en) | 2010-05-06 | 2013-04-02 | Micron Technology, Inc. | Techniques for refreshing a semiconductor memory device |
| US8531878B2 (en) | 2011-05-17 | 2013-09-10 | Micron Technology, Inc. | Techniques for providing a semiconductor memory device |
-
1978
- 1978-11-06 JP JP13574578A patent/JPS5562858A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5626771A (en) * | 1979-08-14 | 1981-03-14 | Sumitomo Electric Industries | Sintered body for cast iron cutting tool and its manufacture |
| JPS5860678A (ja) * | 1981-10-02 | 1983-04-11 | 三菱マテリアル株式会社 | 切削および耐摩耗工具用高靭性窒化硼素基超高圧焼結材料 |
| JPH01131067A (ja) * | 1987-11-18 | 1989-05-23 | Showa Denko Kk | 立方晶窒化ほう素焼結体の製造方法 |
| CN113896537A (zh) * | 2021-12-10 | 2022-01-07 | 山东金鸿新材料股份有限公司 | 一种碳化硼与碳化硅复合陶瓷的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS627149B2 (en:Method) | 1987-02-16 |
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