JPS5562858A - Sintering material with tenacity and abrasion resistance - Google Patents

Sintering material with tenacity and abrasion resistance

Info

Publication number
JPS5562858A
JPS5562858A JP13574578A JP13574578A JPS5562858A JP S5562858 A JPS5562858 A JP S5562858A JP 13574578 A JP13574578 A JP 13574578A JP 13574578 A JP13574578 A JP 13574578A JP S5562858 A JPS5562858 A JP S5562858A
Authority
JP
Japan
Prior art keywords
tenacity
abrasion resistance
sintering material
sintering
abrasion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13574578A
Other languages
Japanese (ja)
Other versions
JPS627149B2 (en
Inventor
Kenichi Nishigaki
Kishiyou Miwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP13574578A priority Critical patent/JPS5562858A/en
Publication of JPS5562858A publication Critical patent/JPS5562858A/en
Publication of JPS627149B2 publication Critical patent/JPS627149B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Ceramic Products (AREA)
JP13574578A 1978-11-06 1978-11-06 Sintering material with tenacity and abrasion resistance Granted JPS5562858A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13574578A JPS5562858A (en) 1978-11-06 1978-11-06 Sintering material with tenacity and abrasion resistance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13574578A JPS5562858A (en) 1978-11-06 1978-11-06 Sintering material with tenacity and abrasion resistance

Publications (2)

Publication Number Publication Date
JPS5562858A true JPS5562858A (en) 1980-05-12
JPS627149B2 JPS627149B2 (en) 1987-02-16

Family

ID=15158875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13574578A Granted JPS5562858A (en) 1978-11-06 1978-11-06 Sintering material with tenacity and abrasion resistance

Country Status (1)

Country Link
JP (1) JPS5562858A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5626771A (en) * 1979-08-14 1981-03-14 Sumitomo Electric Industries Sintered body for cast iron cutting tool and its manufacture
JPS5860678A (en) * 1981-10-02 1983-04-11 三菱マテリアル株式会社 High tenacity boron nitride base super high pressure sintering material for cutting and abrasion-resistant tool
JPH01131067A (en) * 1987-11-18 1989-05-23 Showa Denko Kk Production of cubic boron nitride calcined compact
CN113896537A (en) * 2021-12-10 2022-01-07 山东金鸿新材料股份有限公司 Preparation method of boron carbide and silicon carbide composite ceramic

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010102106A2 (en) 2009-03-04 2010-09-10 Innovative Silicon Isi Sa Techniques for forming a contact to a buried diffusion layer in a semiconductor memory device
WO2010114890A1 (en) 2009-03-31 2010-10-07 Innovative Silicon Isi Sa Techniques for providing a semiconductor memory device
US8139418B2 (en) 2009-04-27 2012-03-20 Micron Technology, Inc. Techniques for controlling a direct injection semiconductor memory device
US8508994B2 (en) 2009-04-30 2013-08-13 Micron Technology, Inc. Semiconductor device with floating gate and electrically floating body
US8498157B2 (en) 2009-05-22 2013-07-30 Micron Technology, Inc. Techniques for providing a direct injection semiconductor memory device
US9076543B2 (en) 2009-07-27 2015-07-07 Micron Technology, Inc. Techniques for providing a direct injection semiconductor memory device
US8576631B2 (en) 2010-03-04 2013-11-05 Micron Technology, Inc. Techniques for sensing a semiconductor memory device
EP2548227B1 (en) 2010-03-15 2021-07-14 Micron Technology, Inc. Techniques for providing a semiconductor memory device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5626771A (en) * 1979-08-14 1981-03-14 Sumitomo Electric Industries Sintered body for cast iron cutting tool and its manufacture
JPS638072B2 (en) * 1979-08-14 1988-02-19 Sumitomo Electric Industries
JPS5860678A (en) * 1981-10-02 1983-04-11 三菱マテリアル株式会社 High tenacity boron nitride base super high pressure sintering material for cutting and abrasion-resistant tool
JPS6225630B2 (en) * 1981-10-02 1987-06-04 Mitsubishi Metal Corp
JPH01131067A (en) * 1987-11-18 1989-05-23 Showa Denko Kk Production of cubic boron nitride calcined compact
CN113896537A (en) * 2021-12-10 2022-01-07 山东金鸿新材料股份有限公司 Preparation method of boron carbide and silicon carbide composite ceramic

Also Published As

Publication number Publication date
JPS627149B2 (en) 1987-02-16

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