JPS5562458A - Making method for photosensitive resin plate - Google Patents

Making method for photosensitive resin plate

Info

Publication number
JPS5562458A
JPS5562458A JP13452578A JP13452578A JPS5562458A JP S5562458 A JPS5562458 A JP S5562458A JP 13452578 A JP13452578 A JP 13452578A JP 13452578 A JP13452578 A JP 13452578A JP S5562458 A JPS5562458 A JP S5562458A
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin plate
making method
film
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13452578A
Other languages
Japanese (ja)
Inventor
Yukihiro Hosaka
Yoshiyuki Harita
Yasuo Terasawa
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP13452578A priority Critical patent/JPS5562458A/en
Publication of JPS5562458A publication Critical patent/JPS5562458A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE: To make the photosensitive resin plate of high thickness accuracy and high resolving power by interposing a plastic film between liquid-form photosensitive resin and negative film and exposing the same in exposure process.
CONSTITUTION: The plastic film composed of the mixture of crystalline 1,2-polybutadiene of crystallinity about 5W45% and intrinsic viscosity (30°C in toluene) about 0.5% or more and about 5W70wt% thereof of the (co)polymer of unsaturated compounds shown by the formula is sandwiched between liquid-form photosensitive resin and negative film and is used. The thickness of the above-mentioned film is preferably 0.005W0.1mm.
COPYRIGHT: (C)1980,JPO&Japio
JP13452578A 1978-11-02 1978-11-02 Making method for photosensitive resin plate Pending JPS5562458A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13452578A JPS5562458A (en) 1978-11-02 1978-11-02 Making method for photosensitive resin plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13452578A JPS5562458A (en) 1978-11-02 1978-11-02 Making method for photosensitive resin plate

Publications (1)

Publication Number Publication Date
JPS5562458A true JPS5562458A (en) 1980-05-10

Family

ID=15130352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13452578A Pending JPS5562458A (en) 1978-11-02 1978-11-02 Making method for photosensitive resin plate

Country Status (1)

Country Link
JP (1) JPS5562458A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5749980A (en) * 1980-07-14 1982-03-24 Hughes Aircraft Co Holographic exposure device and method of producing same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5749980A (en) * 1980-07-14 1982-03-24 Hughes Aircraft Co Holographic exposure device and method of producing same

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