JPS5558387A - Electrodeposition of rutenium indium - Google Patents
Electrodeposition of rutenium indiumInfo
- Publication number
- JPS5558387A JPS5558387A JP8920179A JP8920179A JPS5558387A JP S5558387 A JPS5558387 A JP S5558387A JP 8920179 A JP8920179 A JP 8920179A JP 8920179 A JP8920179 A JP 8920179A JP S5558387 A JPS5558387 A JP S5558387A
- Authority
- JP
- Japan
- Prior art keywords
- rutenium
- electrodeposition
- indium
- rutenium indium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/097—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds comprising two or more noble metals or noble metal alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/924,632 US4189358A (en) | 1978-07-14 | 1978-07-14 | Electrodeposition of ruthenium-iridium alloy |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5558387A true JPS5558387A (en) | 1980-05-01 |
JPS6223078B2 JPS6223078B2 (ja) | 1987-05-21 |
Family
ID=25450462
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8920179A Granted JPS5558387A (en) | 1978-07-14 | 1979-07-13 | Electrodeposition of rutenium indium |
Country Status (3)
Country | Link |
---|---|
US (1) | US4189358A (ja) |
JP (1) | JPS5558387A (ja) |
CA (1) | CA1129805A (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0472577U (ja) * | 1990-11-01 | 1992-06-25 | ||
US5654030A (en) * | 1995-02-07 | 1997-08-05 | Intermedics, Inc. | Method of making implantable stimulation electrodes |
US20030227068A1 (en) * | 2001-05-31 | 2003-12-11 | Jianxing Li | Sputtering target |
US6833058B1 (en) * | 2000-10-24 | 2004-12-21 | Honeywell International Inc. | Titanium-based and zirconium-based mixed materials and sputtering targets |
US20040123920A1 (en) * | 2002-10-08 | 2004-07-01 | Thomas Michael E. | Homogenous solid solution alloys for sputter-deposited thin films |
AU2003277063A1 (en) * | 2002-10-08 | 2004-05-04 | Honeywell International Inc. | Homogenous solid solution alloys for sputter-deposited thin films |
EP1620582B1 (en) | 2003-05-07 | 2016-12-21 | De Nora Tech, Inc. | Smooth surface morphology anode coatings |
KR100601959B1 (ko) * | 2004-07-28 | 2006-07-14 | 삼성전자주식회사 | Ir-Ru 합금 전극 및 이를 하부 전극으로 사용한강유전체 캐패시터 |
CN102864464A (zh) * | 2012-08-31 | 2013-01-09 | 重庆大学 | 一种高催化活性和高稳定性析氢电极的制备方法 |
DE102013202143A1 (de) * | 2013-02-08 | 2014-08-14 | Bayer Materialscience Ag | Katalysatorbeschichtung und Verfahren zu ihrer Herstellung |
CN109518168B (zh) * | 2018-12-14 | 2020-11-03 | 广西大学 | 一种高稳涂层的活性钛基电极板的制备方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3616445A (en) * | 1967-12-14 | 1971-10-26 | Electronor Corp | Titanium or tantalum base electrodes with applied titanium or tantalum oxide face activated with noble metals or noble metal oxides |
-
1978
- 1978-07-14 US US05/924,632 patent/US4189358A/en not_active Expired - Lifetime
-
1979
- 1979-06-19 CA CA330,105A patent/CA1129805A/en not_active Expired
- 1979-07-13 JP JP8920179A patent/JPS5558387A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
US4189358A (en) | 1980-02-19 |
CA1129805A (en) | 1982-08-17 |
JPS6223078B2 (ja) | 1987-05-21 |
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