JPS5558365A - Coating method for titanium compound - Google Patents

Coating method for titanium compound

Info

Publication number
JPS5558365A
JPS5558365A JP13226878A JP13226878A JPS5558365A JP S5558365 A JPS5558365 A JP S5558365A JP 13226878 A JP13226878 A JP 13226878A JP 13226878 A JP13226878 A JP 13226878A JP S5558365 A JPS5558365 A JP S5558365A
Authority
JP
Japan
Prior art keywords
gas
substrate
iodine
coating film
mixed gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13226878A
Other languages
Japanese (ja)
Other versions
JPS6240429B2 (en
Inventor
Moriaki Fuyama
Mitsuru Ura
Haruhiko Honda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP13226878A priority Critical patent/JPS5558365A/en
Priority to US06/053,731 priority patent/US4264682A/en
Publication of JPS5558365A publication Critical patent/JPS5558365A/en
Publication of JPS6240429B2 publication Critical patent/JPS6240429B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To form Ti compound coating film having a sufficient abrasion resisting property and adhesive strength, by mixing more than one kind of hydrocarbon and N2 gas with higher Ti iodide and forming Ti compound under a specific condition introducing the above mixed gas on the substrate. CONSTITUTION:The iodine 12 is heated controlling the temperature of the thermostat 13. A fixed quantity of iodine gas is generated and mixed gas mixed the above iodine gas with reaction gas containing hydrocarbon or N2 gas, is introduced to the Ti sponge 10 and then, TiI4 is formed. The above mixed gas is introduced to the substrate 6 made of ultra hard alloy, heated at 800-1200 deg.C and coating film of TiC or TiN or Ti(C,N), is formed on the substrate 6 reacting under less than 0.5 Torr. of reduced pressure.
JP13226878A 1978-10-27 1978-10-27 Coating method for titanium compound Granted JPS5558365A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP13226878A JPS5558365A (en) 1978-10-27 1978-10-27 Coating method for titanium compound
US06/053,731 US4264682A (en) 1978-10-27 1979-07-02 Surface hafnium-titanium compound coated hard alloy material and method of producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13226878A JPS5558365A (en) 1978-10-27 1978-10-27 Coating method for titanium compound

Publications (2)

Publication Number Publication Date
JPS5558365A true JPS5558365A (en) 1980-05-01
JPS6240429B2 JPS6240429B2 (en) 1987-08-28

Family

ID=15077300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13226878A Granted JPS5558365A (en) 1978-10-27 1978-10-27 Coating method for titanium compound

Country Status (1)

Country Link
JP (1) JPS5558365A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6244572A (en) * 1985-08-21 1987-02-26 Hitachi Carbide Tools Ltd Surface coated tool
JPS62218576A (en) * 1986-03-19 1987-09-25 Kiichiro Kamata Plasma cvd method
WO2005060383A2 (en) * 2003-07-03 2005-07-07 Aeromet Technologies, Inc. Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
CN111386592A (en) * 2017-11-30 2020-07-07 乔治洛德方法研究和开发液化空气有限公司 Composition for forming titanium-containing film for vapor deposition of titanium-containing film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4983679A (en) * 1972-12-19 1974-08-12

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4983679A (en) * 1972-12-19 1974-08-12

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6244572A (en) * 1985-08-21 1987-02-26 Hitachi Carbide Tools Ltd Surface coated tool
JPH0433865B2 (en) * 1985-08-21 1992-06-04 Hitachi Tool
JPS62218576A (en) * 1986-03-19 1987-09-25 Kiichiro Kamata Plasma cvd method
WO2005060383A2 (en) * 2003-07-03 2005-07-07 Aeromet Technologies, Inc. Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
WO2005060383A3 (en) * 2003-07-03 2005-11-17 Aeromet Technologies Inc Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
US7390535B2 (en) 2003-07-03 2008-06-24 Aeromet Technologies, Inc. Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
CN111386592A (en) * 2017-11-30 2020-07-07 乔治洛德方法研究和开发液化空气有限公司 Composition for forming titanium-containing film for vapor deposition of titanium-containing film
CN111386592B (en) * 2017-11-30 2024-01-05 乔治洛德方法研究和开发液化空气有限公司 Composition for forming titanium-containing film for vapor deposition of titanium-containing film

Also Published As

Publication number Publication date
JPS6240429B2 (en) 1987-08-28

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