JPS5548693B2 - - Google Patents
Info
- Publication number
- JPS5548693B2 JPS5548693B2 JP7206873A JP7206873A JPS5548693B2 JP S5548693 B2 JPS5548693 B2 JP S5548693B2 JP 7206873 A JP7206873 A JP 7206873A JP 7206873 A JP7206873 A JP 7206873A JP S5548693 B2 JPS5548693 B2 JP S5548693B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7206873A JPS5548693B2 (en, 2012) | 1973-06-26 | 1973-06-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7206873A JPS5548693B2 (en, 2012) | 1973-06-26 | 1973-06-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5022577A JPS5022577A (en, 2012) | 1975-03-11 |
| JPS5548693B2 true JPS5548693B2 (en, 2012) | 1980-12-08 |
Family
ID=13478700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7206873A Expired JPS5548693B2 (en, 2012) | 1973-06-26 | 1973-06-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5548693B2 (en, 2012) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5239364A (en) * | 1975-09-25 | 1977-03-26 | Hitachi Ltd | Apparatus for printing pattern for shadow mask on dry plate |
| JPS5459883A (en) * | 1978-10-11 | 1979-05-14 | Hitachi Ltd | Pattern printing apparatus |
| DE2905635C2 (de) * | 1979-02-14 | 1987-01-22 | Perkin-Elmer Censor Anstalt, Vaduz | Einrichtung zum Positionieren eines Werkstückes in Z-Richtung beim Projektionskopieren |
| JPS5897008A (ja) * | 1981-12-04 | 1983-06-09 | Hitachi Ltd | 半導体レ−ザとコリメ−タレンズの位置決め方法 |
| JPS5928337A (ja) * | 1982-08-09 | 1984-02-15 | Hitachi Ltd | プロジエクシヨンアライナ |
| JP2780302B2 (ja) * | 1989-02-07 | 1998-07-30 | キヤノン株式会社 | 露光装置 |
| JPH03123016A (ja) * | 1990-08-15 | 1991-05-24 | Hitachi Ltd | 露光方法 |
| JP2637714B2 (ja) * | 1995-07-28 | 1997-08-06 | キヤノン株式会社 | 投影露光装置 |
-
1973
- 1973-06-26 JP JP7206873A patent/JPS5548693B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5022577A (en, 2012) | 1975-03-11 |