JPS5547113B2 - - Google Patents

Info

Publication number
JPS5547113B2
JPS5547113B2 JP15329278A JP15329278A JPS5547113B2 JP S5547113 B2 JPS5547113 B2 JP S5547113B2 JP 15329278 A JP15329278 A JP 15329278A JP 15329278 A JP15329278 A JP 15329278A JP S5547113 B2 JPS5547113 B2 JP S5547113B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15329278A
Other languages
Japanese (ja)
Other versions
JPS5579867A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15329278A priority Critical patent/JPS5579867A/ja
Publication of JPS5579867A publication Critical patent/JPS5579867A/ja
Publication of JPS5547113B2 publication Critical patent/JPS5547113B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
JP15329278A 1978-12-11 1978-12-11 Vacuum evaporation method Granted JPS5579867A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15329278A JPS5579867A (en) 1978-12-11 1978-12-11 Vacuum evaporation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15329278A JPS5579867A (en) 1978-12-11 1978-12-11 Vacuum evaporation method

Publications (2)

Publication Number Publication Date
JPS5579867A JPS5579867A (en) 1980-06-16
JPS5547113B2 true JPS5547113B2 (zh) 1980-11-27

Family

ID=15559279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15329278A Granted JPS5579867A (en) 1978-12-11 1978-12-11 Vacuum evaporation method

Country Status (1)

Country Link
JP (1) JPS5579867A (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0159801B2 (zh) * 1981-03-20 1989-12-19 Nissin Electric Co Ltd
JPH0159802B2 (zh) * 1981-05-27 1989-12-19 Nissin Electric Co Ltd
WO1999026259A1 (fr) * 1997-11-18 1999-05-27 Matsushita Electric Industrial Co., Ltd. Lamine, condensateur et procede de production du lamine

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3224234A1 (de) * 1981-09-01 1983-03-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von metallfreien streifen bei der metallbedampfung eines isolierstoffbandes und vorrichtung zur durchfuehrung des verfahrens
JPS5897823A (ja) * 1981-12-07 1983-06-10 松下電器産業株式会社 金属化フイルムコンデンサの製造方法
IT1185177B (it) * 1985-07-03 1987-11-04 Metalvuoto Films Spa Dispositivo per realizzare film plastici metallizzati presentanti zone ben delimitate prive di metallizzazione
JPS637363A (ja) * 1986-06-25 1988-01-13 Kakogawa Plast Kk 真空蒸着方法
JP3843572B2 (ja) * 1998-01-20 2006-11-08 松下電器産業株式会社 薄膜積層体及び薄膜積層体の製造方法
WO2024203408A1 (ja) * 2023-03-29 2024-10-03 株式会社指月電機製作所 金属化フィルムとその製造方法及びフィルムコンデンサ

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0159801B2 (zh) * 1981-03-20 1989-12-19 Nissin Electric Co Ltd
JPH0159802B2 (zh) * 1981-05-27 1989-12-19 Nissin Electric Co Ltd
WO1999026259A1 (fr) * 1997-11-18 1999-05-27 Matsushita Electric Industrial Co., Ltd. Lamine, condensateur et procede de production du lamine

Also Published As

Publication number Publication date
JPS5579867A (en) 1980-06-16

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