JPS5536923A - Photoresist applicator - Google Patents
Photoresist applicatorInfo
- Publication number
- JPS5536923A JPS5536923A JP10835078A JP10835078A JPS5536923A JP S5536923 A JPS5536923 A JP S5536923A JP 10835078 A JP10835078 A JP 10835078A JP 10835078 A JP10835078 A JP 10835078A JP S5536923 A JPS5536923 A JP S5536923A
- Authority
- JP
- Japan
- Prior art keywords
- spinner
- wafer
- center
- angular velocity
- revolving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To uniform photoresist to the overall face of a wafer by having a correlativity of a mechanism to revolve round a spinner with a distance from the center of spinner revolving on its axis with a wafer mounted thereon satisfy specific conditions.
CONSTITUTION: A photoresist applicator is made up of a spinner 1 revolving on its aixs at angular velocity ωr with a wafer 2 with a radius r mounted thereon and a mechanism with the center at a point in distance R from center B of the spinner 1 which revolves round the spinner 1 at angular velocity ωR in a face including the revolving face of the spinner 1. Then, a correlativity among radius r of the wafer 2, distance R from the center B of the spinner 1, angular velocity ωr of the spinner 1 and angular velocity ωR for revolution is made to satisfy conditions: R>r, (R-r)2 ωR2>r2ωr2. A force in the reverse direction is applied to the wafer 2 at every half- revolution of the wafer 2, a force is applied in the direction where centrifugal forces by both revolutions are synthesized during running, and a force is given in every directions while the wafer 2 revolves once, thereby applying the resist uniformly.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10835078A JPS5536923A (en) | 1978-09-04 | 1978-09-04 | Photoresist applicator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10835078A JPS5536923A (en) | 1978-09-04 | 1978-09-04 | Photoresist applicator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5536923A true JPS5536923A (en) | 1980-03-14 |
Family
ID=14482471
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10835078A Pending JPS5536923A (en) | 1978-09-04 | 1978-09-04 | Photoresist applicator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5536923A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58194337A (en) * | 1982-05-07 | 1983-11-12 | Nec Corp | Preparation of semiconductor device |
| JPS5916332A (en) * | 1982-07-19 | 1984-01-27 | Nec Corp | Manufacture of semiconductor device |
| US5095848A (en) * | 1989-05-02 | 1992-03-17 | Mitsubishi Denki Kabushiki Kaisha | Spin coating apparatus using a tilting chuck |
| US5264246A (en) * | 1989-05-02 | 1993-11-23 | Mitsubishi Denki Kabushiki Kaisha | Spin coating method |
| KR100413849B1 (en) * | 2000-12-28 | 2004-01-07 | 장영철 | Apparatus and method for coating with a layer of photoresist |
-
1978
- 1978-09-04 JP JP10835078A patent/JPS5536923A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58194337A (en) * | 1982-05-07 | 1983-11-12 | Nec Corp | Preparation of semiconductor device |
| JPS5916332A (en) * | 1982-07-19 | 1984-01-27 | Nec Corp | Manufacture of semiconductor device |
| US5095848A (en) * | 1989-05-02 | 1992-03-17 | Mitsubishi Denki Kabushiki Kaisha | Spin coating apparatus using a tilting chuck |
| US5264246A (en) * | 1989-05-02 | 1993-11-23 | Mitsubishi Denki Kabushiki Kaisha | Spin coating method |
| KR100413849B1 (en) * | 2000-12-28 | 2004-01-07 | 장영철 | Apparatus and method for coating with a layer of photoresist |
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