JPS553690B2 - - Google Patents

Info

Publication number
JPS553690B2
JPS553690B2 JP9858675A JP9858675A JPS553690B2 JP S553690 B2 JPS553690 B2 JP S553690B2 JP 9858675 A JP9858675 A JP 9858675A JP 9858675 A JP9858675 A JP 9858675A JP S553690 B2 JPS553690 B2 JP S553690B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9858675A
Other languages
Japanese (ja)
Other versions
JPS5223401A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9858675A priority Critical patent/JPS5223401A/ja
Publication of JPS5223401A publication Critical patent/JPS5223401A/ja
Publication of JPS553690B2 publication Critical patent/JPS553690B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9858675A 1975-08-15 1975-08-15 Method of etching photography Granted JPS5223401A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9858675A JPS5223401A (en) 1975-08-15 1975-08-15 Method of etching photography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9858675A JPS5223401A (en) 1975-08-15 1975-08-15 Method of etching photography

Publications (2)

Publication Number Publication Date
JPS5223401A JPS5223401A (en) 1977-02-22
JPS553690B2 true JPS553690B2 (cs) 1980-01-26

Family

ID=14223742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9858675A Granted JPS5223401A (en) 1975-08-15 1975-08-15 Method of etching photography

Country Status (1)

Country Link
JP (1) JPS5223401A (cs)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5532077A (en) * 1978-08-28 1980-03-06 Sharp Corp Photoresist baking method
JPS56111221A (en) * 1980-01-25 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Formation on mask for etching
DE3110632A1 (de) * 1981-03-19 1982-09-30 Hoechst Ag, 6000 Frankfurt Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen
JPS5919323A (ja) * 1982-07-23 1984-01-31 Matsushita Electric Ind Co Ltd エツチング方法
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
JP2597981B2 (ja) * 1985-08-28 1997-04-09 ソニー株式会社 レジスト膜の硬化処理方法
JPS62113141A (ja) * 1985-11-13 1987-05-25 Fuji Electric Co Ltd フオトリソグラフイ法
JP2589471B2 (ja) * 1986-04-11 1997-03-12 ローム 株式会社 半導体装置の製造方法
JP2589470B2 (ja) * 1986-04-11 1997-03-12 ローム 株式会社 半導体装置の製造方法
JPS63115337A (ja) * 1986-11-04 1988-05-19 Matsushita Electronics Corp フオトレジストの処理方法
JPH0740543B2 (ja) * 1987-02-17 1995-05-01 松下電子工業株式会社 半導体装置の製造方法
JPH06186755A (ja) * 1993-07-01 1994-07-08 Fujitsu Ltd レジストパターンの形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51111072A (en) * 1975-03-26 1976-10-01 Hitachi Ltd Photo etching method

Also Published As

Publication number Publication date
JPS5223401A (en) 1977-02-22

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