JPS553690B2 - - Google Patents
Info
- Publication number
- JPS553690B2 JPS553690B2 JP9858675A JP9858675A JPS553690B2 JP S553690 B2 JPS553690 B2 JP S553690B2 JP 9858675 A JP9858675 A JP 9858675A JP 9858675 A JP9858675 A JP 9858675A JP S553690 B2 JPS553690 B2 JP S553690B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9858675A JPS5223401A (en) | 1975-08-15 | 1975-08-15 | Method of etching photography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9858675A JPS5223401A (en) | 1975-08-15 | 1975-08-15 | Method of etching photography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5223401A JPS5223401A (en) | 1977-02-22 |
| JPS553690B2 true JPS553690B2 (cs) | 1980-01-26 |
Family
ID=14223742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9858675A Granted JPS5223401A (en) | 1975-08-15 | 1975-08-15 | Method of etching photography |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5223401A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH052006Y2 (cs) * | 1985-01-08 | 1993-01-19 | ||
| JPH052965Y2 (cs) * | 1984-07-27 | 1993-01-25 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5532077A (en) * | 1978-08-28 | 1980-03-06 | Sharp Corp | Photoresist baking method |
| JPS56111221A (en) * | 1980-01-25 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Formation on mask for etching |
| DE3110632A1 (de) * | 1981-03-19 | 1982-09-30 | Hoechst Ag, 6000 Frankfurt | Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen |
| JPS5919323A (ja) * | 1982-07-23 | 1984-01-31 | Matsushita Electric Ind Co Ltd | エツチング方法 |
| US4548688A (en) * | 1983-05-23 | 1985-10-22 | Fusion Semiconductor Systems | Hardening of photoresist |
| JP2597981B2 (ja) * | 1985-08-28 | 1997-04-09 | ソニー株式会社 | レジスト膜の硬化処理方法 |
| JPS62113141A (ja) * | 1985-11-13 | 1987-05-25 | Fuji Electric Co Ltd | フオトリソグラフイ法 |
| JP2589471B2 (ja) * | 1986-04-11 | 1997-03-12 | ローム 株式会社 | 半導体装置の製造方法 |
| JP2589470B2 (ja) * | 1986-04-11 | 1997-03-12 | ローム 株式会社 | 半導体装置の製造方法 |
| JPS63115337A (ja) * | 1986-11-04 | 1988-05-19 | Matsushita Electronics Corp | フオトレジストの処理方法 |
| JPH0740543B2 (ja) * | 1987-02-17 | 1995-05-01 | 松下電子工業株式会社 | 半導体装置の製造方法 |
| JPH06186755A (ja) * | 1993-07-01 | 1994-07-08 | Fujitsu Ltd | レジストパターンの形成方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51111072A (en) * | 1975-03-26 | 1976-10-01 | Hitachi Ltd | Photo etching method |
-
1975
- 1975-08-15 JP JP9858675A patent/JPS5223401A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51111072A (en) * | 1975-03-26 | 1976-10-01 | Hitachi Ltd | Photo etching method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH052965Y2 (cs) * | 1984-07-27 | 1993-01-25 | ||
| JPH052006Y2 (cs) * | 1985-01-08 | 1993-01-19 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5223401A (en) | 1977-02-22 |