JPS5531625B2 - - Google Patents

Info

Publication number
JPS5531625B2
JPS5531625B2 JP15103976A JP15103976A JPS5531625B2 JP S5531625 B2 JPS5531625 B2 JP S5531625B2 JP 15103976 A JP15103976 A JP 15103976A JP 15103976 A JP15103976 A JP 15103976A JP S5531625 B2 JPS5531625 B2 JP S5531625B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15103976A
Other languages
Japanese (ja)
Other versions
JPS5274289A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5274289A publication Critical patent/JPS5274289A/ja
Publication of JPS5531625B2 publication Critical patent/JPS5531625B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Junction Field-Effect Transistors (AREA)
JP51151039A 1975-12-17 1976-12-17 Constant resistance circuit Granted JPS5274289A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/641,469 US4001612A (en) 1975-12-17 1975-12-17 Linear resistance element for lsi circuitry

Publications (2)

Publication Number Publication Date
JPS5274289A JPS5274289A (en) 1977-06-22
JPS5531625B2 true JPS5531625B2 (enExample) 1980-08-19

Family

ID=24572528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51151039A Granted JPS5274289A (en) 1975-12-17 1976-12-17 Constant resistance circuit

Country Status (5)

Country Link
US (1) US4001612A (enExample)
JP (1) JPS5274289A (enExample)
DE (1) DE2653484A1 (enExample)
FR (1) FR2335958A1 (enExample)
GB (1) GB1558486A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53147486A (en) * 1977-05-27 1978-12-22 Mitsubishi Electric Corp Semiconductor integrated circuit device
SE7900379L (sv) * 1978-01-25 1979-07-26 Western Electric Co Halvledare-integrerad-krets
FR2430092A1 (fr) * 1978-06-29 1980-01-25 Ibm France Procede de correction du coefficient en tension de resistances semi-conductrices, diffusees ou implantees et resistances ainsi obtenues
DE3026361A1 (de) * 1980-07-11 1982-02-04 Siemens AG, 1000 Berlin und 8000 München Aus mindestens zwei monolitisch zusammengefassten mis-feldeffekttransistoren bestehender elektrischer widerstand fuer integrierte halbleiterschaltungen
JPS5842269A (ja) * 1981-09-05 1983-03-11 Nippon Telegr & Teleph Corp <Ntt> Mis型可変抵抗器
US4430583A (en) * 1981-10-30 1984-02-07 Bell Telephone Laboratories, Incorporated Apparatus for increasing the speed of a circuit having a string of IGFETs
US4942312A (en) * 1985-08-19 1990-07-17 Eastman Kodak Company Integrated-circuit having two NMOS depletion mode transistors for producing stable DC voltage
US5071660A (en) * 1988-06-10 1991-12-10 Phillips Petroleum Company Process utilizing alcohol oxidase
US5010385A (en) * 1990-03-30 1991-04-23 The United States Of America As Represented By The Secretary Of The Navy Resistive element using depletion-mode MOSFET's
WO2011107161A1 (en) * 2010-03-05 2011-09-09 Epcos Ag Resistance component

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5211199B1 (enExample) * 1970-05-27 1977-03-29
US3829888A (en) * 1971-01-08 1974-08-13 Hitachi Ltd Semiconductor device and the method of making the same

Also Published As

Publication number Publication date
JPS5274289A (en) 1977-06-22
GB1558486A (en) 1980-01-03
DE2653484A1 (de) 1977-06-30
US4001612A (en) 1977-01-04
FR2335958B1 (enExample) 1978-12-29
FR2335958A1 (fr) 1977-07-15

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