JPS5531612B2 - - Google Patents
Info
- Publication number
- JPS5531612B2 JPS5531612B2 JP9873676A JP9873676A JPS5531612B2 JP S5531612 B2 JPS5531612 B2 JP S5531612B2 JP 9873676 A JP9873676 A JP 9873676A JP 9873676 A JP9873676 A JP 9873676A JP S5531612 B2 JPS5531612 B2 JP S5531612B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9873676A JPS5324782A (en) | 1976-08-20 | 1976-08-20 | Forming method of high molecular film patterns by negative resist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9873676A JPS5324782A (en) | 1976-08-20 | 1976-08-20 | Forming method of high molecular film patterns by negative resist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5324782A JPS5324782A (en) | 1978-03-07 |
| JPS5531612B2 true JPS5531612B2 (ja) | 1980-08-19 |
Family
ID=14227783
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9873676A Granted JPS5324782A (en) | 1976-08-20 | 1976-08-20 | Forming method of high molecular film patterns by negative resist |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5324782A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10684709B2 (en) | 2015-12-22 | 2020-06-16 | Shenzhen Royole Technologies Co., Ltd. | Electronic bags |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5655044A (en) * | 1979-10-11 | 1981-05-15 | Fujitsu Ltd | Formation of resist pattern |
| JPS58218119A (ja) * | 1982-06-14 | 1983-12-19 | Hitachi Ltd | パタ−ン形成方法 |
| JPS6091639A (ja) * | 1983-10-26 | 1985-05-23 | Alps Electric Co Ltd | フオトレジストパタ−ンの形成方法 |
| JPS62108525A (ja) * | 1985-11-06 | 1987-05-19 | Hitachi Ltd | 表面処理方法およびその装置 |
| JPH0820737B2 (ja) * | 1988-01-29 | 1996-03-04 | 住友ベークライト株式会社 | ポリイミド樹脂の厚膜加工方法 |
-
1976
- 1976-08-20 JP JP9873676A patent/JPS5324782A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10684709B2 (en) | 2015-12-22 | 2020-06-16 | Shenzhen Royole Technologies Co., Ltd. | Electronic bags |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5324782A (en) | 1978-03-07 |